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氮化硼量子点负载的中空 NH-MIL-125 促进光芬顿-PMS 体系用于光催化四环素降解:没食子酸刻蚀的贡献。

Boron nitride quantum dots supported hollow NH-MIL-125 drive photo-Fenton-PMS system for photocatalytic tetracycline degradation: Contribution of tannic acid etching.

机构信息

Key Laboratory of Integrated Regulation and Resources Development on Shallow Lakes of Ministry of Education, College of Environment, Hohai University, Nanjing, 210098, China.

Key Laboratory of Integrated Regulation and Resources Development on Shallow Lakes of Ministry of Education, College of Environment, Hohai University, Nanjing, 210098, China.

出版信息

Chemosphere. 2024 Oct;365:143389. doi: 10.1016/j.chemosphere.2024.143389. Epub 2024 Sep 23.

DOI:10.1016/j.chemosphere.2024.143389
PMID:39321886
Abstract

NH-MIL-125(Ti) materials had great potential for photocatalytic applications but had low activity due to exciton effect and narrow absorption range of visible light. The surface oxygen-containing negative functional groups of boron nitride quantum dots (BNQDs) could overcome these defects, but due to the low load capacity, a higher specific surface area of the substrate was usually required. In this paper, a hollow Ti-MOF material was developed by etching technology. The hollow structure formed by tannic acid etching broadened the absorption range of visable light and provided more alternative surfaces for loading BNQDs. The 85.2% of high tetracycline (TC) removal efficiency for the best sample (BNQDs-5@20-Ti-MOF + PMS) was obtained, which was about 56.8 and 1.9 times of the 20-Ti-MOF and BNQDs-5@20-Ti-MOF, respectively. BNQDs-5@20-Ti-MOF + PMS system showed a great TC degradation efficiency in a wide pH range (pH = 5-9). In addition, reaction temperature and the inorganic ions did not show significant inhibition effect for TC removal. Both free radical and non-free radical pathways were involved in the TC degration by BNQDs-5@20-Ti-MOF + PMS system, among which O and O played the key roles. Interestingly, multiple O production paths contributed to the high efficiency and stability of BNQDs-5@20-Ti-MOF + PMS system. This study revealed a reasonable combination of Ti-MOF and BNQDs, which provided a new efficient photocatalyst for environmental remediation.

摘要

NH-MIL-125(Ti) 材料在光催化应用方面具有很大的潜力,但由于激子效应和可见光吸收范围窄,活性较低。氮化硼量子点 (BNQDs) 的表面含氧负官能团可以克服这些缺陷,但由于负载能力低,通常需要具有更高比表面积的基底。本文采用刻蚀技术制备了中空 Ti-MOF 材料。单宁酸刻蚀形成的中空结构拓宽了可见光的吸收范围,并为 BNQDs 的负载提供了更多的替代表面。最佳样品 (BNQDs-5@20-Ti-MOF+PMS) 的四环素 (TC) 去除率高达 85.2%,分别是 20-Ti-MOF 和 BNQDs-5@20-Ti-MOF 的 56.8 倍和 1.9 倍。BNQDs-5@20-Ti-MOF+PMS 体系在较宽的 pH 值范围内 (pH=5-9) 均表现出较高的 TC 降解效率。此外,反应温度和无机离子对 TC 的去除没有明显的抑制作用。BNQDs-5@20-Ti-MOF+PMS 体系中既涉及自由基途径也涉及非自由基途径,其中 O 和 O 起关键作用。有趣的是,多条 O 生成途径有助于 BNQDs-5@20-Ti-MOF+PMS 体系的高效和稳定。本研究揭示了 Ti-MOF 和 BNQDs 的合理组合,为环境修复提供了一种新的高效光催化剂。

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