Liu Chang, Chen Yiqiang, Xie Yuhan, Liu Hongxia, Cai Zongqi
School of Microelectronics, Xidian University, Xi'an 710071, China.
China Electronic Product Reliability and Environmental Testing Research Institute, Guangzhou 511370, China.
Micromachines (Basel). 2024 Aug 30;15(9):1100. doi: 10.3390/mi15091100.
We have investigated the electrical properties and reliability of AlGaN/GaN high electron mobility transistors (HEMT) under high-temperature RF overdrive stress. The experimental results show that the drain current and transconductance of the device decrease at 25 °C and 55 °C but do not change significantly at 85 °C before and after the stress. The decline rate of the saturation drain current, the degradation amplitude of transconductance, and the drift amplitude of threshold voltage decrease with the increase in temperature. The results of pulse - and low-frequency noise tests show that the current collapse is inhibited, and the trap density is reduced at higher temperatures. The Electroluminescence (EL) test shows that the luminescence characteristics of the device after RF overdrive stress are more scattered and weaker. We believe that the degradation at lower temperatures is mainly due to the influence of the hot electron effect (HEE), while the change in electrical properties at higher temperatures is due to the weakening of HEE and the improvement of the Schottky interface.
我们研究了AlGaN/GaN高电子迁移率晶体管(HEMT)在高温射频过驱动应力下的电学特性和可靠性。实验结果表明,在25℃和55℃时,器件的漏极电流和跨导下降,但在85℃应力前后变化不明显。饱和漏极电流的下降率、跨导的退化幅度和阈值电压的漂移幅度随温度升高而降低。脉冲和低频噪声测试结果表明,在较高温度下电流崩塌受到抑制,陷阱密度降低。电致发光(EL)测试表明,射频过驱动应力后器件的发光特性更加分散且较弱。我们认为,较低温度下的退化主要是由于热电子效应(HEE)的影响,而较高温度下电学特性的变化是由于HEE减弱和肖特基界面的改善。