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四苯基反式二苯并卟啉在Cu(111)上的覆盖度和温度诱导自金属化作用

Coverage- and temperature-induced self-metalation of tetraphenyltransdibenzoporphyrin on Cu(111).

作者信息

Shaker Majid, Muth Maximilian, Steffen Julien, Ceccatto Dos Santos Alisson, Jaekel Simon, Adhikari Rajan, Gazetas Pascal, Oleszak Christoph, de Siervo Abner, Jux Norbert, Görling Andreas, Lytken Ole, Steinrück Hans-Peter

机构信息

Lehrstuhl für Physikalische Chemie II, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstr. 3, Erlangen 91058, Germany.

Lehrstuhl für Theoretische Chemie, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstr. 3, Erlangen 91058, Germany.

出版信息

J Phys Condens Matter. 2024 Dec 12;37(8). doi: 10.1088/1361-648X/ad92d2.

Abstract

We have investigated the adsorption and self-metalation of free-base tetraphenyltransdibenzoporphyrin (2H-TPtdBP) on Cu(111) as a function of coverage and temperature using scanning tunneling microscopy, x-ray photoelectron spectroscopy, temperature programmed desorption, and density-functional theory calculations. At low coverages (<0.16 molecules nm), we observe isolated individual molecules with an inverted conformation and no self-metalation up to 363 K. At higher coverages, both the formation of ordered islands and self-metalation are observed over time already at room temperature, and accelerate upon heating to 363 K. At 423 K, complete self-metalation occurs for all coverages up to the completed first layer. By comparing our results for 2H-TPtdBP to the existing literature on other tetraphenyl-based porphyrins, we demonstrate how adsorption and self-metalation can be tailored by the choice of substituents.

摘要

我们使用扫描隧道显微镜、X射线光电子能谱、程序升温脱附以及密度泛函理论计算,研究了自由碱四苯基反式二苯并卟啉(2H-TPtdBP)在Cu(111)上的吸附和自金属化过程,该过程是覆盖度和温度的函数。在低覆盖度(<0.16分子/纳米)下,我们观察到孤立的单个分子呈倒置构象,在高达363 K的温度下没有自金属化现象。在较高覆盖度下,有序岛的形成和自金属化在室温下就会随时间出现,并在加热到363 K时加速。在423 K时,对于直至完整第一层的所有覆盖度,都会发生完全自金属化。通过将我们对2H-TPtdBP的研究结果与其他基于四苯基的卟啉的现有文献进行比较,我们展示了如何通过取代基的选择来定制吸附和自金属化过程。

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