Sun Fujun, Li Zhihua, Tang Bo, Li Bin, Zhang Peng, Liu Ruonan, Yang Gang, Huang Kai, Han Zhe, Luo Jun, Wang Wenwu, Yang Yan
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.
Beijing University of Posts and Telecommunications, Beijing 100876, China.
Nanophotonics. 2023 Jun 13;12(15):3135-3148. doi: 10.1515/nanoph-2023-0170. eCollection 2023 Jul.
Fano resonance from photonic crystal nanobeam cavity (PCNC) is important building block for large-scale photonic integrated circuits (PICs) to enable photonic switches and sensors with superior characteristics. Nevertheless, most state-of-the-art demonstrations rely on electron beam lithography (EBL) and operate in dielectric mode. Hence, we theoretically, numerically and experimentally present the characteristics of Fano resonance from optical interference between the discrete state of air-mode PCNC and the continuum mode of side-coupled line-defect waveguide with partially transmitting element (PTE) using deep ultraviolet (DUV) lithography for the first time. Experimentally high average -factor of ∼1.58 × 10 is achieved for 30 measured devices, which indicates the feasibility of mass manufacture of high- Fano resonance from air-mode PTE-PCNC. Additionally, the thermo-optic bi-stability and thermal tuning characterizations of the proposed device are discussed. This work will contribute to building ultra-compact lab-on-chip resonance-based photonic components.
光子晶体纳米光束腔（PCNC）的法诺共振是大规模光子集成电路（PIC）的重要组成部分，可实现具有卓越特性的光子开关和传感器。然而，大多数最先进的演示都依赖电子束光刻（EBL），并在介电模式下运行。因此，我们首次在理论、数值和实验上展示了使用深紫外（DUV）光刻技术，通过具有部分透射元件（PTE）的空气模式PCNC的离散态与侧耦合线缺陷波导的连续模式之间的光干涉产生的法诺共振特性。对于30个测量器件，实验上实现了约1.58×10的高平均因子，这表明通过空气模式PTE-PCNC大规模制造高法诺共振的可行性。此外，还讨论了所提出器件的热光双稳性和热调谐特性。这项工作将有助于构建基于超紧凑片上实验室的共振光子组件。
