Ahmad Zain, Parias M R Begoña, Barr Helen, Cabral João T
Department of Chemical Engineering, Imperial College London, London SW7 2AZ, United Kingdom.
Nano Lett. 2025 Jan 15;25(2):740-746. doi: 10.1021/acs.nanolett.4c05019. Epub 2024 Dec 7.
We report a facile approach to suppress intrinsic crack formation during wrinkling of plasma-oxidized polydimethylsiloxane (PDMS) films, removing a major hindrance in the practical use of these ubiquitous, functional surface patterns. A combination of high heat transfer coefficient (HTC) of the film substrate and low PDMS thickness is shown to consistently yield crack-free wrinkling of glassy skin and PDMS bilayers. Employing optical and atomic force microscopy, light scattering, thermal measurements, and heat transport and stress calculations, we demonstrate that our findings hold for a range of glass, plastic, metal, and layered support materials and plasma processing conditions. Subsuming the PDMS contribution to thermal conduction, an overall HTC threshold of ∼800 W/(m K), for typical plasma exposures, for crack-free wrinkling is obtained. While suppressing cracks, this simple approach retains the functionality of the glassy skin of plasma-oxidized PDMS.
我们报道了一种简便的方法来抑制等离子体氧化聚二甲基硅氧烷基(PDMS)薄膜起皱过程中的固有裂纹形成,消除了这些无处不在的功能性表面图案在实际应用中的一个主要障碍。薄膜基底的高传热系数(HTC)和低PDMS厚度的组合被证明能持续产生无裂纹的玻璃状表皮和PDMS双层起皱。通过光学和原子力显微镜、光散射、热测量以及热传输和应力计算,我们证明我们的发现适用于一系列玻璃、塑料、金属和层状支撑材料以及等离子体处理条件。考虑到PDMS对热传导的贡献,对于典型的等离子体暴露,获得了无裂纹起皱的约800 W/(m·K)的总体HTC阈值。在抑制裂纹的同时,这种简单方法保留了等离子体氧化PDMS玻璃状表皮的功能。