Costa-Amaral Rafael, Bae Soungmin, Vu Thi Ngoc Huyen, Kumagai Yu
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.
Organization for Advanced Studies, Tohoku University, Sendai 980-8577, Japan.
ACS Appl Mater Interfaces. 2025 Jan 8;17(1):1605-1614. doi: 10.1021/acsami.4c17868. Epub 2024 Dec 26.
Two-dimensional (2D) β-TeO has gained attention as a promising material for optoelectronic and power device applications, thanks to its transparency and high hole mobility. However, the mechanisms driving its -type conductivity and dopability remain elusive. In this study, we investigate the intrinsic and extrinsic point defects in monolayer and bilayer β-TeO, the latter of which has been experimentally synthesized, using the Heyd-Scuseria-Ernzerhof (HSE) + D3 hybrid functional. Our results reveal that most intrinsic defects are unlikely to contribute to -type doping in 2D β-TeO. Moreover, Si and H contamination could further impair -type conductivity. Since the point defects do not contribute to -type conductivity, we suggest two possible mechanisms for hole conduction: hopping conduction via localized impurity states, and substrate effects. We also explored substitutional -type doping in 2D β-TeO with 10 trivalent elements. Among these, the Bi dopant is found to exhibit a relatively shallow acceptor transition level. However, all the dopants introduce deep localized states, where hole polarons are trapped by the lone pairs of Te atoms. Interestingly, monolayer β-TeO shows potential advantages over bilayers due to reduced self-compensation effects for -type dopants. These findings provide valuable insights into defect engineering strategies for future electronic applications involving 2D β-TeO.
二维(2D)β-TeO因其透明度和高空穴迁移率,作为一种有前途的光电子和功率器件应用材料而受到关注。然而,驱动其n型导电性和可掺杂性的机制仍然难以捉摸。在本研究中,我们使用Heyd-Scuseria-Ernzerhof(HSE)+D3混合泛函研究了单层和双层β-TeO中的本征和非本征点缺陷,其中双层β-TeO已通过实验合成。我们的结果表明,大多数本征缺陷不太可能对2Dβ-TeO中的n型掺杂有贡献。此外,Si和H污染会进一步损害n型导电性。由于点缺陷对n型导电性没有贡献,我们提出了两种可能的空穴传导机制:通过局域杂质态的跳跃传导和衬底效应。我们还探索了用10种三价元素对2Dβ-TeO进行替代n型掺杂。其中,发现Bi掺杂剂表现出相对较浅的受主跃迁能级。然而,所有掺杂剂都会引入深局域态,空穴极化子被Te原子的孤对捕获。有趣的是,由于n型掺杂剂的自补偿效应降低,单层β-TeO比双层β-TeO显示出潜在优势。这些发现为涉及2Dβ-TeO的未来电子应用的缺陷工程策略提供了有价值的见解。