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紫外线C剂量对二级处理污水中抗微生物耐药性元件去除效果的影响。

Effects of UVC doses on the removal of antimicrobial resistance elements from secondary treated sewage.

作者信息

Brovini Emília Marques, Dias Marcela, Teodoro Amanda, Machado Elayne, Santos Letícia, Leal Cintia, de Aquino Sérgio Francisco, de Araújo Juliana Calábria

机构信息

Programa de Pós-Graduação Em Engenharia Ambiental, Universidade Federal de Ouro Preto, Campus Universitário Morro Do Cruzeiro, S/N°, Bauxita, Ouro Preto, MG, 35400-000, Brazil.

Programa de Pós-Graduação Em Saneamento, Meio Ambiente E Recursos Hídricos, Departamento de Engenharia Sanitária E Ambiental, Universidade Federal de Minas Gerais, Av. Antonio Carlos 6627, Belo Horizonte, MG, 31270-901, Brazil.

出版信息

Environ Sci Pollut Res Int. 2025 Feb;32(7):4325-4336. doi: 10.1007/s11356-025-35988-2. Epub 2025 Jan 28.

DOI:10.1007/s11356-025-35988-2
PMID:39873874
Abstract

Wastewater treatment plants (WWTPs) currently face major challenges toward the removal of microcontaminants and/or microbial matrices and consequently play an important role in the potential dissemination of biological resistance in freshwater. The ultraviolet (UV) system is a tertiary treatment strategy increasingly applied worldwide, although many studies have shown that disinfected effluent can still contain antibiotic-resistant bacteria and resistance genes. Therefore, to better understand the effects of UV radiation doses on the removal of all resistance elements (antibiotics, antibiotic-resistant bacteria, and antibiotic resistance genes), the present study was designed using a pilot-scale photoreactor. The UV doses could be varied to investigate whether there is an optimal UV dose capable of removing all resistance elements and also if the UV dose frequently applied in full-scale systems is able to reduce the resistance elements. The effect of different UV doses (A, 0-10 mJ/cm; B, 10-15 mJ/cm; and C, > 15 mJ/cm) in a pilot-scale photoreactor on the removal of antibiotics, antibiotic-resistant bacteria, and genes from the effluent of a UASB reactor followed by a biological trickling filter system (UASB-TF) fed with real sanitary sewage was investigated. Samples of influent and effluent from the UVC photoreactor were collected, and the concentration levels of norfloxacin (NOR), ciprofloxacin (CIP), and levofloxacin (LEV) were assessed. The qnrB, sul1, ermB, integron-integrase (intI1), and 16S rRNA genes, total heterotrophic bacteria (THB), and bacterial resistance to azithromycin and sulfamethoxazole were also investigated. Results indicated that LEV and intI1 were found in the highest median concentrations in the photoreactor influent. Although most antibiotics (NOR and CIP) and ARGs (intI1, 16S rRNA, and qnrB) were apparently better removed with the highest UV dose (> 15 mJ/cm) applied, except for LEV, sul1, and ermB genes, the Kruskal-Wallis test reported no significant difference between low and high doses. ARB removal (from 80 to 100%) was observed at all UV doses. Principal component analysis (PCA) suggested a clear pattern of pollutant groups, i.e., antibiotics, ARG, and ARB, which exhibited low (median of 8-16%), medium (37-96%), and high (> 97%) removal percentages, respectively. These results demonstrated that UVC photoreactors can be an alternative to complement biological treatment in sewage treatment plants at the dose normally applied in full-scale WWTPs (> 15 mJ/cm). However, there was no optimal single dose capable of removing all the resistance elements investigated.

摘要

污水处理厂目前在去除微污染物和/或微生物基质方面面临重大挑战,因此在淡水生物抗性的潜在传播中发挥着重要作用。紫外线(UV)系统是一种在全球范围内越来越多地应用的三级处理策略,尽管许多研究表明,经过消毒的废水仍然可能含有抗生素抗性细菌和抗性基因。因此,为了更好地了解紫外线辐射剂量对去除所有抗性元素(抗生素、抗生素抗性细菌和抗生素抗性基因)的影响,本研究使用中试规模的光反应器进行设计。可以改变紫外线剂量,以研究是否存在能够去除所有抗性元素的最佳紫外线剂量,以及全规模系统中常用的紫外线剂量是否能够降低抗性元素。研究了中试规模光反应器中不同紫外线剂量(A,0 - 10 mJ/cm²;B,10 - 15 mJ/cm²;C,> 15 mJ/cm²)对来自上流式厌氧污泥床(UASB)反应器后续接生物滴滤系统(UASB - TF)且以实际生活污水为进水的出水中抗生素、抗生素抗性细菌和基因的去除效果。收集了UVC光反应器的进水和出水样品,并评估了诺氟沙星(NOR)、环丙沙星(CIP)和左氧氟沙星(LEV)的浓度水平。还研究了qnrB、sul1、ermB、整合子整合酶(intI1)和16S rRNA基因、总异养细菌(THB)以及细菌对阿奇霉素和磺胺甲恶唑的抗性。结果表明,光反应器进水中LEV和intI1的中位浓度最高。尽管在应用最高紫外线剂量(> 15 mJ/cm²)时,大多数抗生素(NOR和CIP)和抗生素抗性基因(intI1、16S rRNA和qnrB)的去除效果明显更好,但除了LEV、sul1和ermB基因外,Kruskal - Wallis检验表明低剂量和高剂量之间没有显著差异。在所有紫外线剂量下均观察到抗生素抗性细菌的去除率(从80%到100%)。主成分分析(PCA)表明污染物组有明显的模式,即抗生素、抗生素抗性基因和抗生素抗性细菌,其去除率分别为低(中位数为8 - 16%)、中(37 - 96%)和高(> 97%)。这些结果表明,在全规模污水处理厂通常应用的剂量(> 15 mJ/cm²)下,UVC光反应器可以作为污水处理厂生物处理的补充替代方法。然而,不存在能够去除所有所研究抗性元素的最佳单一剂量。

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