Erdemir Guler Yagiz
Department of Chemistry, Faculty of Science, Gazi University, Ankara, 06560, Turkey.
J Fluoresc. 2025 Mar 21. doi: 10.1007/s10895-025-04240-y.
Herein, new tetraarylpyrrolo[3,2-b]pyrroles (TAPP) containing different substituents (4a-c, 5a-c) on the N-phenyl rings were synthesized in high yields using a one-pot method. The 3,6 positions of the pyrrolopyrol ring of the 4a-c compound were formylated by Vilsmeier-Haack reaction to synthesize a new pyrrolopyrol compound containing the acceptor-donor-acceptor (A-D-A) system (5a-c). The photophysical properties of all obtained derivatives were investigated in different solvents. According to the results obtained, the absorptions of derivatives 4a-c were recorded around 400 nm and their emission intensities appeared around 450 nm. The absorption intensities of derivatives 4b and 5b were recorded as 400 nm and 350 nm, respectively, while their emission intensities were observed as 455 and 440. In the A-D-A system formed as a result of the bonding of electron-withdrawing formyl groups at position 3,6 of the TAPP structure, a high Stokes shift occurred, while 50 nm hypsochromic shifts were observed in its absorption.
在此,使用一锅法以高产率合成了在N-苯基环上含有不同取代基(4a - c、5a - c)的新型四芳基吡咯并[3,2 - b]吡咯(TAPP)。通过Vilsmeier - Haack反应将4a - c化合物的吡咯并吡咯环的3,6位甲酰化,以合成一种含有受体 - 供体 - 受体(A - D - A)体系的新型吡咯并吡咯化合物(5a - c)。在不同溶剂中研究了所有所得衍生物的光物理性质。根据所得结果,衍生物4a - c的吸收在400 nm左右记录,其发射强度出现在450 nm左右。衍生物4b和5b的吸收强度分别记录为400 nm和350 nm,而它们的发射强度分别观察为455和440。在TAPP结构的3,6位上吸电子甲酰基键合形成的A - D - A体系中,出现了高斯托克斯位移,同时在其吸收中观察到50 nm的紫移。