Li Weidian, He Siyuan, Chen Wenfa, Lyu Pin, Liu Ying, Bao Jincheng, Kan Caixia, Jiang Mingming, Cao Shuiyan, Liu Yanpeng
College of Physics, Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China.
State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China.
Small Methods. 2025 May 2:e2402180. doi: 10.1002/smtd.202402180.
Electrically driven host-dopant structure, such as single Ga-doped ZnO microwire, is promising for miniaturized light sources. However, the electroluminescence (EL) for a fixed concentration of Ga dopant barely vary for a single ZnO micro/nanostructure, limiting their applications in integrated optoelectronics. Here X-ray irradiation is reported as a simple and effective post-treatment to tailor the EL intensity and color coordinate of Ga-doped ZnO microwires. After irradiating the microwires under an X-ray dose of 180 Gy, the intensity of green EL light increases by ≈12 times, accompanied by a narrowed spectrum linewidth. Meanwhile, the EL color coordinate shifts from (0.309, 0.416) for pristine microwires to (0.319, 0.503) for X-ray irradiated ones, corresponding to more purified green emission. The EL intensity monotonically increases (>20 times) with further increments of irradiation doses, and intense X-ray irradiations shift the EL color center toward the green-yellow spectral region and a total average redshift of ≈30±6 nm is achieved. The density functional theory (DFT) simulations suggest that the EL variation may stem from the substitution of host Zn atoms by interstitial Ga dopant stimulated by high-energy X-ray. These presented results indicate X-ray irradiation is a potential post-treatment strategy for host-dopant light emitters toward practical applications.
电驱动的主体-掺杂结构,如单根掺镓氧化锌微线,有望用于小型化光源。然而,对于单个氧化锌微/纳米结构,固定浓度的镓掺杂剂的电致发光(EL)几乎没有变化,这限制了它们在集成光电子学中的应用。在此报道了X射线辐照作为一种简单有效的后处理方法,可调节掺镓氧化锌微线的EL强度和色坐标。在180 Gy的X射线剂量下辐照微线后,绿色EL光的强度增加了约12倍,同时光谱线宽变窄。与此同时,EL色坐标从原始微线的(0.309, 0.416)变为X射线辐照微线的(0.319, 0.503),对应于更纯净的绿色发射。随着辐照剂量的进一步增加,EL强度单调增加(>20倍),强烈的X射线辐照使EL色心向绿黄色光谱区域移动,实现了约30±6 nm的总平均红移。密度泛函理论(DFT)模拟表明,EL变化可能源于高能X射线刺激间隙镓掺杂剂取代主体锌原子。这些结果表明,X射线辐照是一种潜在的后处理策略,可用于主体-掺杂发光体的实际应用。