Anh Nguyen P Q, Cuu Ho V, Tan Truong, Nguyen Chuong V, Hieu Nguyen N
Faculty of Engineering and Technology, Saigon University 273 An Duong Vuong Street, Ward 2, District 5 Ho Chi Minh City Vietnam.
Department of Materials Science and Engineering, Le Quy Don Technical University Hanoi 100000 Vietnam.
Nanoscale Adv. 2025 May 8. doi: 10.1039/d5na00181a.
In this work, we explore the electronic and optical properties of the SiH/γ-GeSe heterostructure using first-principles calculations, emphasizing its remarkable tunability under applied electric fields. Our findings demonstrate that the SiH/γ-GeSe heterostructure exhibits stability, indicating its feasibility for future synthesis. The SiH/γ-GeSe exhibits type-I band alignment and an indirect band gap, with optical absorption characteristics revealing enhanced absorption in specific energy regions, highlighting its potential for advanced optoelectronic applications. Under the influence of electric fields, the SiH/γ-GeSe heterostructure transitions to type-II band alignment and switches to a direct band gap, which significantly improves charge separation and light absorption efficiency. These findings underscore the versatility of the SiH/γ-GeSe heterostructure, positioning it as a promising candidate for a wide range of electronic and optoelectronic applications.
在这项工作中,我们使用第一性原理计算来探索SiH/γ-GeSe异质结构的电子和光学性质,强调其在施加电场下具有显著的可调性。我们的研究结果表明,SiH/γ-GeSe异质结构具有稳定性,这表明其未来合成的可行性。SiH/γ-GeSe呈现I型能带排列和间接带隙,其光学吸收特性显示在特定能量区域吸收增强,突出了其在先进光电子应用中的潜力。在电场影响下,SiH/γ-GeSe异质结构转变为II型能带排列并转变为直接带隙,这显著提高了电荷分离和光吸收效率。这些发现强调了SiH/γ-GeSe异质结构的多功能性,使其成为广泛电子和光电子应用的有前途的候选材料。