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通过实验和密度泛函理论研究二氯硅烷歧化制备一氯硅烷的反应循环机理及关键反应因素

Deciphering the Reaction Cycle Mechanisms and Key Reaction Factors of Monochlorosilane by Disproportionation of Dichlorosilane via Experiments and Density Functional Theory.

作者信息

Sun Ke, Mao Qiuyun, Zheng Jianyun, Liu Jianhua, Yuan Zhenjun, Gu Guangan, Li Guopeng, Wan Ye, Zhong Qifan

机构信息

School of Metallurgy and Environment, Central South University, Changsha 410083, PR China.

Department of Educational Science, Hunan First Normal University, Changsha 410205, PR China.

出版信息

ACS Omega. 2025 May 8;10(19):19480-19490. doi: 10.1021/acsomega.4c11528. eCollection 2025 May 20.

Abstract

Monochlorosilane (MCS) is an important silicon-based precursor for the fabrication of semiconductors and integrated circuits. The MCS production partly depends on the catalytic disproportionation of dichlorosilane (DCS). The DCS disproportionation has been critical yet challenging due to the involvement of multiple reversible reactions and other byproducts, often resulting in suboptimal yields of MCS. This investigation explored the sensitive conditions and key controlling factors affecting MCS yield in DCS disproportionation using gas chromatography-mass spectrometry (GC-MS). With increasing feed rates, the temperature requirement for DCS disproportionation gradually increased, and the sensitivity became significantly enhanced at high pressures. The optimal reaction conditions were 0.2 kg/h, 323.15 K, and 0.3 MPa. More importantly, density functional theory (DFT) calculations revealed the complete reaction cycle pathways of MCS generation. In these pathways, DCS dehydrogenation was identified as the rate-determining step, exhibiting the antagonistic effect with MCS disproportionation. The SiHCl-SiHCl species, acting as the key intermediate, decomposed after promoting chlorine transfer to produce MCS and trichlorosilane (TCS). Furthermore, chloride ions, as byproducts, not only removed reactants but also acted as the chlorine source. This study provides significant theoretical guidance for the precise control of chlorosilane disproportionation reactions and the design of related catalysts.

摘要

一氯硅烷(MCS)是用于制造半导体和集成电路的重要硅基前驱体。MCS的生产部分依赖于二氯硅烷(DCS)的催化歧化反应。由于涉及多个可逆反应和其他副产物,DCS歧化反应一直是关键但具有挑战性的,这常常导致MCS的产率不理想。本研究使用气相色谱 - 质谱联用仪(GC - MS)探索了影响DCS歧化反应中MCS产率的敏感条件和关键控制因素。随着进料速率的增加,DCS歧化反应所需的温度逐渐升高,并且在高压下灵敏度显著增强。最佳反应条件为0.2 kg/h、323.15 K和0.3 MPa。更重要的是,密度泛函理论(DFT)计算揭示了MCS生成的完整反应循环途径。在这些途径中,DCS脱氢被确定为速率决定步骤,与MCS歧化反应呈现拮抗作用。作为关键中间体的SiHCl - SiHCl物种在促进氯转移后分解,生成MCS和三氯硅烷(TCS)。此外,作为副产物的氯离子不仅去除反应物,还充当氯源。本研究为精确控制氯硅烷歧化反应及相关催化剂的设计提供了重要的理论指导。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3263/12096235/c8e743d52548/ao4c11528_0001.jpg

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