Geng Shining, Chen Dazhi, Guo Zhenghua, Li Qian, Wen Manyu, Wang Jiahui, Guo Kaidi, Wang Jing, Wang Yu, Yu Liang, Li Xinglong, Li Xiaohu
Beijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, China.
Beijing Institute of Technology, Zhengzhou Academy of Intelligent Technology, Zhengzhou 450000, China.
Membranes (Basel). 2025 Apr 27;15(5):130. doi: 10.3390/membranes15050130.
The wastewater from Chemical Mechanical Polishing (CMP) generated in the semiconductor industry contains a significant concentration of suspended particles and necessitates rigorous treatment to meet environmental standards. Ceramic ultrafiltration membranes offer significant advantages in treating such high-solid wastewater, including a high separation efficiency, environmental friendliness, and straightforward cleaning and maintenance. However, the preparation of high-precision ceramic ultrafiltration membranes with a smaller pore size (usually <20 nm) is very complicated, requiring the repeated construction of transition layers, which not only increases the time and economic costs of manufacturing but also leads to an elevated transport resistance. In this work, halloysite nanotubes (HNTs), characterized by their high aspect ratio and lumen structure, were utilized to create a high-porosity transition layer using a spray-coating technique, onto which a γ-AlO ultrafiltration selective layer was subsequently coated. Compared to the conventional α-AlO transition multilayers, the HNTs-derived transition layer not only had an improved porosity but also had a reduced pore size. As such, this strategy tended to simplify the preparation process for the ceramic membranes while reducing the transport resistance. The resulting high-flux γ-AlO ultrafiltration membranes were used for the high-efficiency treatment of CMP wastewater, and the fouling behaviors were investigated. As expected, the HNTs-mediated γ-AlO ultrafiltration membranes exhibited excellent water flux (126 LMH) and high rejection (99.4%) of inorganic particles in different solvent systems. In addition, such membranes demonstrated good operation stability and regeneration performance, showing promise for their application in the high-efficiency treatment of CMP wastewater in the semiconductor industry.
半导体行业化学机械抛光（CMP）产生的废水含有高浓度悬浮颗粒，需要严格处理以符合环境标准。陶瓷超滤膜在处理此类高固体含量废水方面具有显著优势，包括分离效率高、环保以及清洗和维护简便。然而，制备孔径较小（通常<20 nm）的高精度陶瓷超滤膜非常复杂，需要反复构建过渡层，这不仅增加了制造的时间和经济成本，还导致传输阻力升高。在这项工作中，以高长径比和管腔结构为特征的埃洛石纳米管（HNTs）被用于通过喷涂技术创建高孔隙率过渡层，随后在其上涂覆γ -AlO超滤选择层。与传统的α -AlO过渡多层结构相比，由HNTs衍生的过渡层不仅孔隙率提高，而且孔径减小。因此，该策略倾向于简化陶瓷膜的制备过程，同时降低传输阻力。所得的高通量γ -AlO超滤膜用于CMP废水的高效处理，并对其污染行为进行了研究。正如预期的那样，HNTs介导的γ -AlO超滤膜在不同溶剂体系中表现出优异的水通量（126 LMH）和对无机颗粒的高截留率（99.4%）。此外，此类膜表现出良好的运行稳定性和再生性能，在半导体行业CMP废水的高效处理中具有应用前景。
