Zhao Tianchen, Guo Luguang, Gao Qilong, Wang Xu, Lyu Binghai, Li Chen
College of Mechanical Engineering, Quzhou University, Quzhou 324000, China.
College of Mechanical Engineering, Zhejiang University of Technology, Hangzhou 310023, China.
Micromachines (Basel). 2025 May 13;16(5):572. doi: 10.3390/mi16050572.
Compliant rheological polishing advanced in facilitating the generation of smooth curved surfaces. However, the inherent energy dissipation of the medium during flow results in an uncontrollable material removal distribution. This study proposes utilizing the motion of the tool to regulate the distribution of physical fields within the computational domain, thereby controlling material removal. A film thickness model is developed based on fluid dynamics and tribology principles to examine the pressure and velocity distributions within the film. In conjunction with contact mechanics and metallography, a material removal model is formulated and then validated and refined by valid experiment, demonstrating a positive correlation between material removal rate and surface quality. Optimization experiments produced a curved surface with an of 17.59 nm.
柔顺流变抛光在促进光滑曲面的生成方面具有优势。然而，介质在流动过程中固有的能量耗散导致材料去除分布无法控制。本研究提出利用工具的运动来调节计算域内物理场的分布，从而控制材料去除。基于流体动力学和摩擦学原理建立了膜厚模型，以研究膜内的压力和速度分布。结合接触力学和金相学，建立了材料去除模型，然后通过有效实验进行验证和完善，证明了材料去除率与表面质量之间存在正相关关系。优化实验得到了均方根粗糙度为17.59 nm的曲面。
