Najaf Tomaraei Golnaz, Abdulhafez Moataz, Ghosh Soumalya, Lee Jaegeun, Bedewy Mostafa
Department of Mechanical Engineering and Materials Science, University of Pittsburgh, 3700 O'Hara Street, Pittsburgh Pennsylvania 15261, United States.
Department of Industrial Engineering, University of Pittsburgh, 3700 O'Hara Street, Pittsburgh Pennsylvania 15261, United States.
Ind Eng Chem Res. 2025 May 27;64(23):11327-11339. doi: 10.1021/acs.iecr.4c03787. eCollection 2025 Jun 11.
Geometric nonuniformities are often observed in the catalytic chemical vapor deposition (CVD) of vertically aligned carbon nanotubes (VACNTs), known as CNT forests. These nonuniformities typically occur in the form of sloped heights and empty regions within the catalyst-covered substrate. To realize the true potential of carbon nanotube forests in unidirectional mass and energy transport applications, it is critical to develop robust manufacturing processes to produce geometrically uniform CNT forests on large-scale substrates in a repeatable manner. Our custom-designed reactor with an IR heating multizone furnace with rapid thermal processing capability allows the programming of dynamic recipes with the catalyst formation temperature decoupled from the CNT nucleation and growth temperature. In this work, we present an approach for tuning the geometric uniformity of CNT forests based on the combined effects of substrate holder design and dynamic recipes during CVD. We propose a mechanism that explains the observed geometric nonuniformities based on both the temperature profile across the catalyst chip, which depends on the substrate holder design, and the temperature range for CNT growth, which depends on the catalyst formation temperature. We performed a comparative study of the properties of alumina layers after annealing with two different substrate holder designs. We found that the actual temperature experienced by the sample depends on the substrate holder, which supports our proposed mechanism. Our work provides insight into the growth of CNT forests with large-scale spatial uniformity and high structural quality.
在垂直排列的碳纳米管(VACNTs,即碳纳米管森林)的催化化学气相沉积(CVD)过程中,经常会观察到几何不均匀性。这些不均匀性通常表现为催化剂覆盖的基板内高度倾斜和存在空白区域的形式。为了在单向质量和能量传输应用中实现碳纳米管森林的真正潜力,开发强大的制造工艺以在大规模基板上以可重复的方式生产几何均匀的碳纳米管森林至关重要。我们定制设计的带有具有快速热处理能力的红外加热多区炉的反应器,允许编写动态工艺,使催化剂形成温度与碳纳米管成核和生长温度解耦。在这项工作中,我们提出了一种基于化学气相沉积过程中基板支架设计和动态工艺的综合影响来调整碳纳米管森林几何均匀性的方法。我们提出了一种机制,该机制基于横跨催化剂芯片的温度分布(这取决于基板支架设计)以及碳纳米管生长的温度范围(这取决于催化剂形成温度)来解释观察到的几何不均匀性。我们对采用两种不同基板支架设计退火后的氧化铝层的性能进行了比较研究。我们发现样品实际经历的温度取决于基板支架,这支持了我们提出机制。我们的工作为具有大规模空间均匀性和高结构质量的碳纳米管森林的生长提供了见解。