Scagliotti Mattia, Valletta Antonio, Milita Silvia, Mariucci Luigi, Giusi Gino, Bouaamlat Hussam, Seitsonen Ari Paavo, Branchini Paolo, Tortora Luca, Rapisarda Matteo
CNR-IMM, Institute for Microelectronics and Microsystems IMM, Rome 00133, Italy.
CNR-ISMN, Institute of Nanostructured Materials ISMN, Bologna 40129, Italy.
ACS Appl Mater Interfaces. 2025 Jul 2;17(26):38305-38320. doi: 10.1021/acsami.5c07824. Epub 2025 Jun 18.
The electrical performance of organic thin-film transistors (OTFTs) based on DNTT as the semiconductor active layer (DNTT, which stands for dinaphtho [2,3-b:2',3'-] thieno [3,2-] thiophene) is investigated and related to the structural properties of the organic films grown on SiO and Cytop substrates. Conventional current-voltage measurements and high-sensitivity low-frequency measurements show a lower mobility and correspondingly higher defect density for DNTT/SiO devices. Morphological and structural characterizations of DNTT films grown on the two dielectrics were performed using atomic force microscopy (AFM) and X-ray diffraction (XRD), revealing a highly ordered crystalline structure. Consistent with DFT simulation results, morphological analysis shows that the semiconductor films are layered, with DNTT molecules arranged with their longest axis perpendicular to the substrate. However, in only DNTT/SiO films, some molecules were found to be ordered and arranged parallel to the substrate. This "horizontal" orientation causes differences in charge transport properties in the semiconductor films grown on SiO, reducing the field-effect mobility. TCAD simulations indicate that this horizontal molecular orientation can be modeled as highly defective regions at semiconductor grain boundaries, consistent with low-frequency noise measurement results.
研究了以DNTT(二萘并[2,3-b:2',3'-]噻吩并[3,2-b]噻吩)作为半导体活性层的有机薄膜晶体管(OTFT)的电学性能,并将其与生长在SiO和Cytop衬底上的有机薄膜的结构特性相关联。常规的电流-电压测量和高灵敏度低频测量表明,DNTT/SiO器件的迁移率较低,相应地缺陷密度较高。使用原子力显微镜(AFM)和X射线衍射(XRD)对生长在两种电介质上的DNTT薄膜进行了形态和结构表征,揭示了高度有序的晶体结构。与密度泛函理论(DFT)模拟结果一致,形态分析表明半导体薄膜是分层的,DNTT分子以其最长轴垂直于衬底的方式排列。然而,仅在DNTT/SiO薄膜中,发现一些分子有序且平行于衬底排列。这种“水平”取向导致生长在SiO上的半导体薄膜中的电荷传输特性存在差异,降低了场效应迁移率。TCAD模拟表明,这种水平分子取向可以被模拟为半导体晶粒边界处的高度缺陷区域,这与低频噪声测量结果一致。