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职业性接触安氟醚或氟烷期间的血浆氟化物和溴化物浓度

Plasma fluoride and bromide concentrations during occupational exposure to enflurane or halothane.

作者信息

Carlsson P, Ekstrand J, Hallén B

出版信息

Acta Anaesthesiol Scand. 1985 Oct;29(7):669-73. doi: 10.1111/j.1399-6576.1985.tb02278.x.

DOI:10.1111/j.1399-6576.1985.tb02278.x
PMID:4072590
Abstract

The plasma fluoride and bromide concentrations were studied in operating theatre personnel. When enflurane was used, the increase in plasma fluoride concentration could not be distinguished from normal individual variations, but the plasma bromide concentration increased significantly when halothane was used. Seven patients were exposed to enflurane in a concentration of 200 parts per million for 4 h. A significant increase in the plasma concentration of fluoride was observed. The peak concentrations of fluoride occurred during exposure and the increase lasted less than 12 h. The increase in fluoride concentration was larger at this trace concentration than reported after anaesthetic concentrations. Cerebrospinal fluid (CSF) fluoride concentration was also studied; a smaller and delayed increase was found in CSF compared to plasma.

摘要

对手术室工作人员的血浆氟化物和溴化物浓度进行了研究。使用恩氟烷时,血浆氟化物浓度的升高与正常个体差异无法区分,但使用氟烷时血浆溴化物浓度显著升高。7名患者暴露于百万分之200浓度的恩氟烷中4小时。观察到血浆氟化物浓度显著升高。氟化物的峰值浓度出现在暴露期间,且升高持续时间不到12小时。在这种痕量浓度下氟化物浓度的升高比麻醉浓度后报道的更大。还研究了脑脊液(CSF)氟化物浓度;与血浆相比,脑脊液中发现的升高较小且延迟。

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1
Plasma fluoride and bromide concentrations during occupational exposure to enflurane or halothane.职业性接触安氟醚或氟烷期间的血浆氟化物和溴化物浓度
Acta Anaesthesiol Scand. 1985 Oct;29(7):669-73. doi: 10.1111/j.1399-6576.1985.tb02278.x.
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