Wu Zebang, Liu Xun, Zhu Hongqiang, Yan Yi, Luo Lei, Yin Kaihui, Yue Yuanxia, Yang Ying, Feng Qing
College of Physics and Electronic Engineering, Chongqing Normal University, Chongqing 401331, China.
The Andrew and Erna Viterbi School of Engineering, University of Southern California, Los Angeles, California 90089, United States.
ACS Omega. 2025 Jul 24;10(30):33806-33813. doi: 10.1021/acsomega.5c04913. eCollection 2025 Aug 5.
This paper studies the adsorption energy, differential charge density, work function, energy band, density of states, optical properties, and recovery time of intrinsic GaN and transition metal Ni-doped GaN in adsorbing reducing gases H, HS, and NH based on the first principles. The results show that the adsorption of H, HS, and NH on the intrinsic GaN surface all belongs to physical adsorption. The adsorption of the three gases by Ni-doped GaN is all chemical adsorption, and the adsorption energies are -0.94, -1.45, and -1.41 eV, respectively, making the adsorption more stable. Ni doping enhances the charge transfer between the GaN surface and the gas, reducing the work function and bandgap width of the adsorption system. The maximum absorption coefficient of the doped system in the visible-light range is approximately 30% higher than that of the intrinsic GaN. The recovery times of Ni-doped GaN adsorbing H, HS, and NH can be adjusted to 5.2, 3.4, and 7.2 s, respectively, by controlling the temperature. This study provides theoretical support for the detection and sensing of H, HS, and NH gases based on GaN substrates.
本文基于第一性原理研究了本征GaN和过渡金属Ni掺杂GaN在吸附还原气体H、HS和NH时的吸附能、差分电荷密度、功函数、能带、态密度、光学性质以及恢复时间。结果表明,H、HS和NH在本征GaN表面的吸附均属于物理吸附。Ni掺杂GaN对这三种气体的吸附均为化学吸附,吸附能分别为-0.94、-1.45和-1.41 eV,使得吸附更加稳定。Ni掺杂增强了GaN表面与气体之间的电荷转移,降低了吸附体系的功函数和带隙宽度。掺杂体系在可见光范围内的最大吸收系数比本征GaN高出约30%。通过控制温度,Ni掺杂GaN吸附H、HS和NH的恢复时间可分别调整为5.2、3.4和7.2 s。本研究为基于GaN衬底的H、HS和NH气体检测与传感提供了理论支持。