Normark S, Boman H G, Matsson E
J Bacteriol. 1969 Mar;97(3):1334-42. doi: 10.1128/jb.97.3.1334-1342.1969.
In a mutation experiment with a rough, ampicillin-resistant strain, we isolated two smooth mutants which were both sensitive to ampicillin and carried defects in the cell envelope. One of the strains (with the envA gene) is hindered in its completion of septa and forms chains of cells. The envA gene has been mapped to a position between leu and proB, at 2 to 4 min. The envA gene decreased the resistance mediated by both episomal and chromosomal genes for resistance to several antibiotics. During growth the envA mutant was characterized by abnormal ratios between viable count or cell count and optical density. The ratio between viable count and optical density was affected during shift-up and shift-down experiments. When compared to the parent strain, the envA mutant was found to be more resistant to ultraviolet irradiation on plates. Prestarvation for tryptophan had a protective effect against irradiation both on the parent strain and the envA mutant.
在对粗糙型氨苄青霉素抗性菌株进行的突变实验中,我们分离出了两个光滑型突变体,它们对氨苄青霉素均敏感,且细胞膜存在缺陷。其中一个菌株(带有envA基因)在隔膜形成过程中受阻,形成细胞链。envA基因已被定位到leu和proB之间的位置,在2至4分钟处。envA基因降低了由附加体和染色体基因介导的对几种抗生素的抗性。在生长过程中,envA突变体的特征是活菌数或细胞数与光密度之间的比例异常。在升档和降档实验中,活菌数与光密度之间的比例受到影响。与亲本菌株相比,发现envA突变体在平板上对紫外线照射更具抗性。色氨酸预饥饿对亲本菌株和envA突变体的辐射均有保护作用。