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嘧啶二聚体DNA糖基化酶与脱嘌呤/脱嘧啶DNA内切核酸酶的物理关联对紫外线损伤DNA的修复至关重要。

Physical association of pyrimidine dimer DNA glycosylase and apurinic/apyrimidinic DNA endonuclease essential for repair of ultraviolet-damaged DNA.

作者信息

Nakabeppu Y, Sekiguchi M

出版信息

Proc Natl Acad Sci U S A. 1981 May;78(5):2742-6. doi: 10.1073/pnas.78.5.2742.

Abstract

T4 endonuclease V [endodeoxyribonuclease (pyrimidine dimer), EC 3.1.25.1)], which is involved in repair of UV-damaged DNA, has been purified to apparent physical homogeneity. Incubation of UV-irradiated poly(dA).poly(dT) with the purified enzyme preparations resulted in production of alkali-labile apyrimidinic sites, followed by formation of nicks in the polymer. The activity to produce alkali-labile sites was optimal in a relatively broad pH range (pH 6.0-8.5), whereas the activity to form nicks had a narrow optimum near pH 6.5. By performing a limited reaction with T4 endonuclease V at pH 8.5, irradiated polymer was converted to an intermediate form that carried a large number of alkali-labile sites but only a few nicks. The intermediate was used as substrate for the assay of apurinic/apyrimidinic DNA endonuclease activity [endodeoxyribonuclease (apurinic or apyrimidinic, EC 2.1.25.2]. The two activities, a pyrimidine dimer DNA glycosylase and an apurinic/apyrimidinic DNA endonuclease, were copurified and found in enzyme preparations that contained only a 16,000-dalton polypeptide. An enzyme fraction from cells infected with bacteriophage T4v1, a mutant that is sensitive to UV radiation, was defective in both glycosylase and endonuclease activities. Moreover, occurrence of an amber mutation in the denV gene caused a simultaneous loss of the two activities, and suppression of the mutation rendered both activities partially active. These results strongly suggested that a DNA glycosylase specific for pyrimidine dimers and an apurinic/apyrimidinic DNA endonuclease reside in a single polypeptide chain coded by the denV gene of bacteriophage T4. Because the two activities exhibited different thermosensitivity, it was further suggested that conformation of the active sites for these activities may be different.

摘要

T4核酸内切酶V[内切脱氧核糖核酸酶(嘧啶二聚体),EC 3.1.25.1]参与紫外线损伤DNA的修复,已被纯化至表观物理均一性。用纯化的酶制剂孵育紫外线照射的聚(dA)·聚(dT),会产生碱不稳定的脱嘧啶位点,随后聚合物中形成切口。产生碱不稳定位点的活性在相对较宽的pH范围内(pH 6.0 - 8.5)最佳,而形成切口的活性在pH 6.5附近有一个狭窄的最佳值。通过在pH 8.5下与T4核酸内切酶V进行有限反应,照射的聚合物转化为一种中间形式,该中间形式带有大量碱不稳定位点但只有少数切口。该中间产物用作测定脱嘌呤/脱嘧啶DNA内切酶活性[内切脱氧核糖核酸酶(脱嘌呤或脱嘧啶,EC 2.1.25.2)]的底物。这两种活性,即嘧啶二聚体DNA糖基化酶和脱嘌呤/脱嘧啶DNA内切酶,被共纯化,并在仅含有16,000道尔顿多肽的酶制剂中发现。来自感染对紫外线辐射敏感的噬菌体T4v1的细胞的酶组分,在糖基化酶和内切酶活性方面均有缺陷。此外,denV基因中琥珀突变的出现导致这两种活性同时丧失,而该突变的抑制使这两种活性部分恢复。这些结果强烈表明,一种对嘧啶二聚体特异的DNA糖基化酶和一种脱嘌呤/脱嘧啶DNA内切酶存在于由噬菌体T4的denV基因编码的单一多肽链中。由于这两种活性表现出不同的热敏感性,进一步表明这些活性的活性位点构象可能不同。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6f7a/319433/68a5342a4ec6/pnas00656-0117-a.jpg

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