Jacobson E L, Antol K M, Juarez-Salinas H, Jacobson M K
J Biol Chem. 1983 Jan 10;258(1):103-7.
Exposure of human fibroblasts to 5 J/m2 of UV light resulted in a rapid increase of up to 1500% in the intracellular content of poly(ADP-ribose) and a rapid depletion of its metabolic precursor, NAD. When added just prior to UV treatment, the poly(ADP-ribose) polymerase inhibitor, 3-aminobenzamide, totally blocked both the increase of poly(ADP-ribose) and decrease in NAD for up to 2.5 h. Addition of 3-aminobenzamide at the time of maximal accumulation of poly(ADP-ribose) resulted in a decrease to basal levels with a half-life of approximately 6 min. The rates of accumulation of poly(ADP-ribose) and depletion of NAD were increased in the presence of either 1-beta-arabinofuranosylcytosine or hydroxyurea. Since these agents are known to cause an additional accumulation of DNA strand breaks following UV irradiation, these data provide evidence for a mechanism in which the rate of poly(ADP-ribose) synthesis following DNA damage is regulated in intact cells by the number of DNA strand breaks. Under conditions in which the synthesis of poly(ADP-ribose) was blocked, DNA repair replication induced by UV light was neither stimulated nor inhibited.
将人类成纤维细胞暴露于5焦耳/平方米的紫外线下,会导致细胞内聚(ADP - 核糖)含量迅速增加高达1500%,并使其代谢前体NAD迅速消耗。在紫外线处理前加入聚(ADP - 核糖)聚合酶抑制剂3 - 氨基苯甲酰胺,可在长达2.5小时内完全阻断聚(ADP - 核糖)的增加和NAD的减少。在聚(ADP - 核糖)积累达到最大值时加入3 - 氨基苯甲酰胺,会使其降至基础水平,半衰期约为6分钟。在存在1 - β - 阿拉伯呋喃糖基胞嘧啶或羟基脲的情况下,聚(ADP - 核糖)的积累速率和NAD的消耗速率会增加。由于已知这些试剂会在紫外线照射后导致DNA链断裂进一步积累,这些数据为一种机制提供了证据,即完整细胞中DNA损伤后聚(ADP - 核糖)合成速率受DNA链断裂数量的调节。在聚(ADP - 核糖)合成被阻断的条件下,紫外线诱导的DNA修复复制既未受到刺激也未受到抑制。