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采用两种小连接体设计的近端菌斑堆积情况。

Proximal plaque accumulation with two minor connector designs.

作者信息

El Ghamrawy E, Runov J

出版信息

J Oral Rehabil. 1980 Jan;7(1):27-30. doi: 10.1111/j.1365-2842.1980.tb01459.x.

DOI:10.1111/j.1365-2842.1980.tb01459.x
PMID:6987346
Abstract

The relationship of plaque accumulation to two different designs of a proximal minor connector, was studied in twenty-seven removable partial denture wearers. On thirty proximal surfaces adjacent to a closed space design, and on thirty-two surfaces adjacent to an open space design, plaque formation was recorded using a plaque scoring system. Mean plaque scores were calculated separately for the two types of design, and no difference was found between the two sets of scores.

摘要

在27名可摘局部义齿佩戴者中,研究了菌斑堆积与两种不同设计的近中支托小连接体之间的关系。在与封闭间隙设计相邻的30个近中表面以及与开放间隙设计相邻的32个表面上,使用菌斑评分系统记录菌斑形成情况。分别计算两种设计类型的平均菌斑评分,两组评分之间未发现差异。

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