Knapek E
Ultramicroscopy. 1982;10(1-2):71-86. doi: 10.1016/0304-3991(82)90189-9.
Radiation damage is one of the most severe problems in the electron microscopy of organic materials. Observations which were made in an electron microscope with a superconducting lens system have shown that the damage caused by the electron beam is considerably reduced by one to two orders of magnitude if the specimen is cooled to liquid helium temperature (4.2 K). This cryoprotection is even higher in favorable cases, particularly when embedded specimens are used. The cryoprotection decreases for specimens mounted on plastic carrier films due to the low thermal and electrical conductivity of these materials at low temperatures.
辐射损伤是有机材料电子显微镜观察中最严重的问题之一。在配备超导透镜系统的电子显微镜中进行的观察表明,如果将样品冷却至液氦温度(4.2K),电子束造成的损伤会大幅降低一到两个数量级。在有利的情况下,这种低温保护效果甚至更高,特别是使用包埋样品时。由于这些材料在低温下的热导率和电导率较低,安装在塑料载膜上的样品的低温保护效果会降低。