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基底膜位置调制对耳蜗微音器电位的影响。

Effect of modulation of basilar membrane position on the cochlear microphonic.

作者信息

Pierson M, Møller A

出版信息

Hear Res. 1980 Mar;2(2):151-62. doi: 10.1016/0378-5955(80)90036-2.

Abstract

Certain characteristics of the extracellular cochlear microphonic (CM) recorded by intracochlear electrodes change in a bimodal manner as a function of prior acoustic exposure, intensity of stimulation, or stimulus frequency. In the present study, it is shown that biasing the basilar membrane position toward scala tympani serves to enhance the CM amplitude when the cochlea is unfatigued, when low-intensity stimuli are used, or when frequencies below the best frequency of a differential electrode pair are used. Conversely, after acoustic fatigue, or during high-intensity or high-frequency stimulation, the microphonic potential is enhanced by a movement of the basilar membrane toward the scala vestibuli. The two populations of hair cells, whose responses are enhanced and diminished on opposing positions of the basilar membrane, are probably outer and inner hair cells.

摘要

通过耳蜗内电极记录的细胞外耳蜗微音器电位(CM)的某些特征,会根据先前的声学暴露、刺激强度或刺激频率以双峰方式变化。在本研究中,结果表明,当耳蜗未疲劳时、使用低强度刺激时或使用低于差分电极对最佳频率的频率时,将基底膜位置偏向鼓阶有助于增强CM振幅。相反,在声学疲劳后,或在高强度或高频刺激期间,基底膜向前庭阶移动会增强微音器电位。其反应在基底膜相反位置增强和减弱的两类毛细胞,可能分别是外毛细胞和内毛细胞。

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