Viguera A R, Serrano L
EMBL, Heidelberg, Germany.
J Mol Biol. 1995 Aug 4;251(1):150-60. doi: 10.1006/jmbi.1995.0422.
Statistical analysis of the protein database indicates that the presence of a particular sequence fingerprint, involving a Gly residue at position i, two hydrophobic residues at positions i + 1 and i-4, and a polar or Ala residue at position i-2, is found at the C-terminal end of alpha-helices 5.9 times more frequently than expected from a random distribution. This particular sequence fingerprint is frequently associated (approximately 50% of the cases) with a local motif known as the Schellman motif. Formation of this motif with the above fingerprint is accompanied by an interaction between the side-chains of the two hydrophobic residues (97% of the cases). To assess the role of this hydrophobic interaction in helix stability and in the formation of the Schellman motif, we have analysed by nuclear magnetic resonance (NMR) and far-UV circular dichroism (CD) a set of polyalanine-based peptides containing the sequence fingerprint described above. Our results show that this motif is not populated to a large extent in aqueous solution and contributes little to alpha-helix stability, the opposite to what has previously been found in two local motifs at the N termini of helices (hydrophobic staple and capping-box). Addition of 30% (v/v) trifluoroethanol results in the formation of the hydrophobic interaction between residues i-4 and i + 1 of the fingerprint, thus showing that there are no sequence or sterical reasons that prevent its formation in aqueous solution. This motif could be an example of a local interaction selected both on a stability basis and because of three-dimensional packing reasons.
对蛋白质数据库的统计分析表明,一种特定的序列指纹存在于α-螺旋的C末端,其出现频率比随机分布预期的高5.9倍。该序列指纹涉及第i位的甘氨酸残基、第i + 1位和i - 4位的两个疏水残基以及第i - 2位的极性或丙氨酸残基。这种特定的序列指纹经常(约50%的情况)与一种称为Schellman基序的局部基序相关联。具有上述指纹的该基序的形成伴随着两个疏水残基侧链之间的相互作用(97%的情况)。为了评估这种疏水相互作用在螺旋稳定性和Schellman基序形成中的作用,我们通过核磁共振(NMR)和远紫外圆二色性(CD)分析了一组含有上述序列指纹的聚丙氨酸基肽。我们的结果表明,该基序在水溶液中没有大量形成,对α-螺旋稳定性的贡献很小,这与之前在螺旋N末端的两个局部基序(疏水钉和封端盒)中发现的情况相反。添加30%(v/v)的三氟乙醇会导致指纹中第i - 4位和i + 1位残基之间形成疏水相互作用,从而表明没有序列或空间位阻原因阻止其在水溶液中形成。这个基序可能是一个基于稳定性以及三维堆积原因而选择的局部相互作用的例子。