Olsen I, Birkeland J M
Scand J Dent Res. 1975 Nov;83(6):370-4. doi: 10.1111/j.1600-0722.1975.tb00451.x.
To evaluate the "resting" pH and induced pH changes in denture plaque, soft deposits were collected from the fitting surface of the denture, pooled and suspended in water. Plaque pH was determined with microelectrode equipment before and after mouth rinsing with a sucrose solution. A characteristic level in the "resting" pH of denture plaque was found in most of 12 subjects tested. pH values below the baseline level were recorded for more than 2 h after a rinse. The pH depressions were more pronounced in maxillary than in mandibular plaque. Further, the pH minima tended to be lower in subjects with denture stomatitis than in controls. No clear relationship could be established between the "resting" pH and the concentration of Candida hyphae in denture smears or palatal inflammation.
为评估义齿菌斑中的“静止”pH值及诱导的pH值变化，从义齿贴合面收集软沉积物，集中并悬浮于水中。在用蔗糖溶液漱口前后，用微电极设备测定菌斑pH值。在大多数测试的12名受试者中发现了义齿菌斑“静止”pH值的特征水平。漱口后2小时以上记录到pH值低于基线水平。上颌菌斑的pH值下降比下颌菌斑更明显。此外，义齿性口炎患者的pH值最低点往往低于对照组。义齿涂片上白色念珠菌菌丝浓度或腭部炎症与“静止”pH值之间未发现明确关系。
