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间接嵌体系统的边缘适合性与微渗漏

Marginal fit and microleakage of indirect inlay systems.

作者信息

Reid J S, Saunders W P, Baidas K M

机构信息

Department of Child Dental Care, Glasgow Dental Hospital and School.

出版信息

Am J Dent. 1993 Apr;6(2):81-4.

PMID:8397988
Abstract

Three different indirect adhesive inlay systems were investigated for marginal fit and microleakage. MOD cavities were prepared in 67 extracted sound premolar teeth initially with parallel cavity walls. Thirty-four of the premolars had the cavity walls modified to a 10 degrees and 33 to a 15 degrees occlusal divergence. EOS, Isosit and Hi-Ceram porcelain inlays did not fit cavities prepared with parallel walls. All inlays in the Isosit and porcelain groups were able to be seated without modifications in cavities prepared with either a 10 degrees or 15 degrees occlusal divergence. Inlays made by the EOS system required considerable modification of the fitting surface in order for them to fit. Results showed the EOS system to have the largest marginal gaps before cementation (P < 0.001). There was no significant difference in leakage between the three inlay systems after cementation (P < 0.05). The cementum margins leaked more than margins finished on enamel for all inlay systems (P < 0.05). It is concluded from this study that inlay cavities for Isosit and porcelain require at least a 10 degrees occlusal divergence of cavity walls to permit the fitting of inlays without unacceptable modification. The EOS inlays required considerable trimming even when a 15 degrees occlusal divergence of the cavity walls was used.

摘要

对三种不同的间接粘结嵌体系统进行了边缘适合性和微渗漏研究。在67颗拔除的健康前磨牙上制备MOD洞形,最初洞壁平行。其中34颗前磨牙的洞壁修改为10度的咬合面外展,33颗修改为15度的咬合面外展。EOS、Isosit和Hi-Ceram瓷嵌体不适合平行壁制备的洞形。Isosit组和瓷组的所有嵌体在10度或15度咬合面外展制备的洞形中无需修改即可就位。EOS系统制作的嵌体需要对贴合面进行大量修改才能就位。结果显示,EOS系统在粘结前边缘间隙最大(P < 0.001)。三种嵌体系统粘结后渗漏无显著差异(P < 0.05)。所有嵌体系统的牙骨质边缘渗漏均多于釉质边缘(P < 0.05)。本研究得出结论,Isosit和瓷嵌体的洞形至少需要10度的洞壁咬合面外展,以允许嵌体就位而无需进行不可接受的修改。即使使用15度的洞壁咬合面外展,EOS嵌体仍需要大量修整。

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Marginal fit and microleakage of indirect inlay systems.间接嵌体系统的边缘适合性与微渗漏
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