Collaert B, Edwardsson S, Attström R, Hase J C, Aström M
Department of Periodontology, Centre for Oral Health Sciences, University of Lund, Malmö, Sweden.
Oral Microbiol Immunol. 1993 Feb;8(1):36-41. doi: 10.1111/j.1399-302x.1993.tb00540.x.
The aim of this double blind, cross-over, microbiological study was to compare the effect of topical application of the plaque control agent 0.5% delmopinol HCl with placebo on early supragingival plaque formation. Six subjects underwent 7 periods (0.5, 1, 2, 8 and 24 h and 3 and 7 days) of placebo and delmopinol application, respectively. At the start of each study period the teeth were professionally cleaned and 2 ml of placebo and delmopinol 0.5%, respectively, were applied on all teeth (twice daily for periods lasting 24 h or more). At the end of each period, supragingival plaque samples of one upper and one lower buccal tooth surface were collected separately and cultured on anaerobically incubated Brucella blood agar, on aerobically incubated blood agar and on selective media for the enumeration of Streptococcus spp., Haemophilus spp., Actinomyces spp., Veillonella spp., Neisseria spp. and Fusobacterium spp. The total anaerobic cultivable microflora after delmopinol use was 10-100 times lower than after placebo use. Compared with placebo, the proportion of cultivable aerobes (61.3%), Streptococcus spp. (104.8%) and Haemophilus spp. (82.3%) increased and the proportion of Actinomyces spp. (86.1%), Veillonella spp. (60.5%), Neisseria spp. (96.9%) and Fusobacterium spp. (60.6%) decreased after 7 days. Short-term application of 0.5% delmopinol HCl on supragingival dental plaque regrowth resulted in a reduction of the number of cultivable microorganisms in the plaque and produced a shift in the cultivable plaque composition.
这项双盲、交叉、微生物学研究的目的是比较局部应用菌斑控制剂0.5%盐酸地莫匹醇与安慰剂对早期龈上菌斑形成的影响。六名受试者分别经历了7个阶段(0.5、1、2、8和24小时以及3和7天)的安慰剂和地莫匹醇应用。在每个研究阶段开始时,对牙齿进行专业清洁,分别将2毫升安慰剂和0.5%地莫匹醇应用于所有牙齿(持续24小时或更长时间的阶段每天两次)。在每个阶段结束时,分别收集一颗上颌和一颗下颌颊侧牙面的龈上菌斑样本,并在厌氧培养的布鲁氏菌血琼脂、需氧培养的血琼脂和用于计数链球菌属、嗜血杆菌属、放线菌属、韦荣球菌属、奈瑟菌属和梭杆菌属的选择性培养基上培养。使用地莫匹醇后可培养的总厌氧微生物群比使用安慰剂后低10至100倍。与安慰剂相比,7天后可培养需氧菌(61.3%)、链球菌属(104.8%)和嗜血杆菌属(82.3%)的比例增加,而放线菌属(86.1%)、韦荣球菌属(60.5%)、奈瑟菌属(96.9%)和梭杆菌属(60.6%)的比例下降。在龈上牙菌斑再生长上短期应用0.5%盐酸地莫匹醇导致菌斑中可培养微生物数量减少,并使可培养菌斑组成发生变化。