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对耐150 nM甲氨蝶呤的近四倍体和近二倍体V79克隆之间基因扩增倾向的比较。

A comparison of the propensity for gene amplification between near-tetraploid and near-diploid V79 clones resistant to 150 nM methotrexate.

作者信息

Hashimoto M W, Nikaido O, Kobayashi N, Chang C C, Trosko J E, Mori T

机构信息

Division of Radiation Biology, Kanazawa University, Kanazawa 920, Japan.

出版信息

Carcinogenesis. 1996 Mar;17(3):389-94. doi: 10.1093/carcin/17.3.389.

Abstract

Among various 150-nM methotrexate-resistant (MTXr) V79 clones isolated, we found that two near-tetraploid clones as well as a near-diploid clone with amplification in the dihydrofolate reductase (dhfr) gene readily developed resistant to 40 000 nM MTX within 3 months during stepwise increased MTX selection, while two near-diploid clones without gene amplification could not acquire resistance beyond 5000 nM MTX. Then, we studied how the clones increased the resistance to MTX, and compared the propensity for gene amplification among three types of clones. Dot blot analysis showed that the acquisition of the high levels of resistance to MTX observed in two near-tetraploid clones and a near-diploid clone with gene amplification was associated with amplification in the dhfr gene. The amplified dhfr gene was overexpressed at mRNA and protein levels in the clones. Southern blot analysis of Hind III- and Eco RI-digested DNA in the clones at the time when they became resistant to 10 000 nM MTX indicated that they amplified the dhfr gene fragments which existed in low amounts in parental V79 cells, and that no gross rearrangement of the amplified dhfr gene was detected. Furthermore, fluorescence in situ hybridization analysis showed that the amplified dhfr gene was located on one chromosome as cluster(s). On the other hand, two near-diploid clones without gene amplification did not show any amplification of the dhfr gene even at 5000 nM-MTX resistant stage. These combined results suggest that the near-tetraploid clone as well as the near-diploid clone with the dhfr gene amplification have genomic instability with the propensity for gene amplification during stepwise MTX selection, and have a similar process for the development of the dhfr gene amplification.

摘要

在分离得到的各种150 nM甲氨蝶呤耐药(MTXr)V79克隆中,我们发现两个近四倍体克隆以及一个二氢叶酸还原酶(dhfr)基因扩增的近二倍体克隆在逐步增加甲氨蝶呤选择的过程中,在3个月内很容易对40000 nM甲氨蝶呤产生耐药性,而两个没有基因扩增的近二倍体克隆在超过5000 nM甲氨蝶呤时无法获得耐药性。然后,我们研究了这些克隆如何增加对甲氨蝶呤的耐药性,并比较了三种类型克隆之间基因扩增的倾向。斑点印迹分析表明,在两个近四倍体克隆和一个有基因扩增的近二倍体克隆中观察到的对甲氨蝶呤高水平耐药性的获得与dhfr基因的扩增有关。扩增的dhfr基因在克隆的mRNA和蛋白质水平上过度表达。在克隆对10000 nM甲氨蝶呤产生耐药性时,对其经Hind III和Eco RI消化的DNA进行Southern印迹分析表明,它们扩增了亲本V79细胞中少量存在的dhfr基因片段,并且未检测到扩增的dhfr基因有明显重排。此外,荧光原位杂交分析表明,扩增的dhfr基因以簇的形式位于一条染色体上。另一方面,两个没有基因扩增的近二倍体克隆即使在5000 nM甲氨蝶呤耐药阶段也未显示dhfr基因的任何扩增。这些综合结果表明,近四倍体克隆以及具有dhfr基因扩增的近二倍体克隆在逐步甲氨蝶呤选择过程中具有基因组不稳定性和基因扩增倾向,并且在dhfr基因扩增的发展过程中有相似的过程。

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