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半导体制造工厂中的肺功能与一般疾病症状

Lung function and general illness symptoms in a semiconductor manufacturing facility.

作者信息

Luo J C, Hsu K H, Hsieh L L, Wong C J, Chang M J

机构信息

Department of Public Health, Chang Gung Medical College, Tao-Yuan, Taiwan, ROC.

出版信息

J Occup Environ Med. 1998 Oct;40(10):895-900. doi: 10.1097/00043764-199810000-00010.

Abstract

Large quantities of potent gases, dopants, photoactive chemicals (photoresists, photoinitiators), solvents, and ionizing radiation are used in the semiconductor manufacturing process, but little is known about the occurrence of respiratory disease from exposures in this industry. The purpose of this study was to assess the pulmonary risk by conducting pulmonary function tests and symptoms survey in a semiconductor plant in Taiwan. This study is part of a clinical survey conducted on 926 workers in a semiconductor plant in Taiwan in July 1995. The study items included a standard self-administered questionnaire, chest x-rays, pulmonary function tests, and physical examinations in 249 workers. There was a borderline significance of higher prevalence (P = 0.06) of restrictive lung abnormality in male photolithographic workers (4 of 21; 19.1%) than in male control workers (0 of 17; 0%), and the smoking- and age-adjusted odds ratio was 4.1 (95% confidence interval [CI], 0.41-41.6). There was a significantly higher prevalence (P = 0.02) of restrictive lung abnormality in male ion-implantation workers (5 of 19; 26.3%) than in male control workers (0 of 17; 0%), and the smoking- and age-adjusted odds ratio was 3.7 (95% CI, 0.52-26.7). There were significantly higher prevalences of airway irritation, eye irritation, headache, stress, tiredness, and poor memory in female photolithographic or etch/diffusion workers than in control workers. This study suggests that restrictive lung abnormality is a potential health effect in male silicon-wafer fabrication workers in the semiconductor industry. The tasks of male process, maintenance, and equipment engineers put them at risk for intermittent short-term peak exposure. This may account for a higher prevalence of mild restrictive lung abnormality among male engineers of photolithographic and ionimplantation sections. The findings of this medical surveillance are tentative, but they suggest that further investigation of the etiologic factors and the subsequent health effects is necessary.

摘要

半导体制造过程中会使用大量强效气体、掺杂剂、光活性化学品(光刻胶、光引发剂)、溶剂和电离辐射,但对于该行业接触这些物质导致呼吸道疾病的情况却知之甚少。本研究的目的是通过对台湾一家半导体工厂的工人进行肺功能测试和症状调查,来评估肺部风险。本研究是1995年7月对台湾一家半导体工厂的926名工人进行的临床调查的一部分。研究项目包括一份标准的自填式问卷、胸部X光检查、肺功能测试以及对249名工人进行的体格检查。男性光刻工人中限制性肺异常的患病率(21人中4人,19.1%)高于男性对照工人(17人中0人,0%),差异具有临界显著性(P = 0.06),经吸烟和年龄调整后的优势比为4.1(95%置信区间[CI],0.41 - 41.6)。男性离子注入工人中限制性肺异常的患病率(19人中5人,26.3%)显著高于男性对照工人(17人中0人,0%)(P = 0.02),经吸烟和年龄调整后的优势比为3.7(95%CI,0.52 - 26.7)。女性光刻或蚀刻/扩散工人中气道刺激、眼睛刺激、头痛、压力、疲劳和记忆力差的患病率显著高于对照工人。本研究表明,限制性肺异常是半导体行业男性硅片制造工人潜在的健康影响。男性工艺、维护和设备工程师的工作任务使他们面临间歇性短期峰值暴露的风险。这可能解释了光刻和离子注入部门男性工程师中轻度限制性肺异常患病率较高的原因。本医学监测的结果是初步的,但表明有必要进一步调查病因及后续健康影响。

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