Yajima T, Umeki N, Itai S
Department of Pharmaceutics, Taisho Pharmaceutical Co., Ltd., Saitama, Japan.
Chem Pharm Bull (Tokyo). 1999 Feb;47(2):220-5. doi: 10.1248/cpb.47.220.
The effects of operating conditions in the spray-congealing process on the release and the micromeritic properties of clarithromycin (CAM) wax matrix were evaluated. CAM wax matrix with 30% CAM, 60% glyceryl monostearate (GM) and 10% aminoalkyl methacrylate copolymer E (AMCE) was manufactured at various atomizer wheel speeds and liquid feed rates with a spray dryer. Release of CAM from the matrix exhibited a two-phase pattern, probably due to the dissolution of the fine portions broken on the surface of the matrix. The slope and the extrapolated y-intercept of the subsequent release pattern were defined as the release rate and the initial amount of release of CAM from the matrix, respectively. These release parameters, as well as the volume median diameter and the specific surface area of matrix, were selected as response variables, and multiple regression analysis was performed. For specific surface area and initial amount of release, a minimum point was observed on the contour curve when the atomizer wheel speed was constant and the liquid feed rate was varied. For the release rate, a maximum point was observed on the contour curve under the same conditions. These points were considered preferable for masking the bitter taste of CAM preparation. Microscopic observation revealed that a small spherical matrix with a smooth surface could be obtained with a high atomizer wheel speed and optimum liquid feed rate. This matrix also possessed excellent properties for taste masking, with small initial amount of release and subsequent high rate of release. In conclusion, the congealing speed of melt droplets was the dominant factor in masking the bitter taste of CAM.
评估了喷雾冷凝过程中的操作条件对克拉霉素(CAM)蜡基质的释放和粉体学性质的影响。采用喷雾干燥器,在不同的雾化轮速度和液体进料速率下制备了含有30%CAM、60%单硬脂酸甘油酯(GM)和10%甲基丙烯酸氨基烷基酯共聚物E(AMCE)的CAM蜡基质。CAM从基质中的释放呈现出两相模式,这可能是由于基质表面破碎的细小部分溶解所致。随后释放模式的斜率和外推y轴截距分别定义为CAM从基质中的释放速率和初始释放量。选择这些释放参数以及基质的体积中值直径和比表面积作为响应变量,并进行多元回归分析。对于比表面积和初始释放量,当雾化轮速度恒定且改变液体进料速率时,在等高线上观察到一个最低点。对于释放速率,在相同条件下在等高线上观察到一个最高点。这些点被认为有利于掩盖CAM制剂的苦味。显微镜观察表明,在高雾化轮速度和最佳液体进料速率下,可以获得表面光滑的小球形基质。该基质还具有优异的掩味性能,初始释放量小,随后释放速率高。总之,熔滴的凝固速度是掩盖CAM苦味的主要因素。