Navaratnam S, Claridge J
Multidisciplinary Research and Innovation Centre, North East Wales Institute, Wrexham, UK.
Photochem Photobiol. 2000 Sep;72(3):283-90. doi: 10.1562/0031-8655(2000)072<0283:pppoo>2.0.co;2.
Steady-state fluorescence has been used to study the excited singlet state of ofloxacin (OFLX) in aqueous solutions. Fluorescence emission was found to be pH dependent, with a maximum quantum yield of 0.17 at pH 7. Two pKa*s of around 2 and 8.5 were obtained for the excited singlet state. Laser flash photolysis and pulse radiolysis have been used to study the excited states and free radicals of OFLX in aqueous solutions. OFLX undergoes monophotonic photoionization from the excited singlet state with a quantum yield of 0.2. The cation radical so produced absorbs maximally at 770 nm with an extinction coefficient of 5000 +/- 500 dm3 mol-1 cm-1. This is confirmed by one-electron oxidation in the pulse radiolysis experiments. The hydrated electron produced in the photoionization process reacts with ground state OFLX with a rate constant of 2.0 +/- 0.2 x 10(10) dm3 mol-1 s-1, and the anion thus produced has two absorption bands at 410 nm (extinction coefficient = 3000 +/- 300 dm3 mol-1 cm-1) and at 530 nm. Triplet-triplet absorption has a maximum at 610 nm with an extinction coefficient of 11,000 +/- 1500 dm3 mol-1 cm-1. The quantum yield of triplet formation has been determined to be 0.33 +/- 0.05. In the presence of oxygen, the triplet reacts to form both excited singlet oxygen and superoxide anion with quantum yields of 0.13 and < or = 0.2, respectively. Moreover, superoxide anion is also formed by the reaction of oxygen with the hydrated electron from photoionization. Hence the photosensitivity due to OFLX could be initiated by the oxygen radicals and/or by OFLX radicals acting as haptens.
稳态荧光已被用于研究氧氟沙星(OFLX)在水溶液中的激发单重态。发现荧光发射依赖于pH值,在pH 7时最大量子产率为0.17。激发单重态的两个pKa*约为2和8.5。激光闪光光解和脉冲辐解已被用于研究OFLX在水溶液中的激发态和自由基。OFLX从激发单重态进行单光子光电离,量子产率为0.2。如此产生的阳离子自由基在770 nm处有最大吸收,消光系数为5000±500 dm3 mol-1 cm-1。这在脉冲辐解实验中的单电子氧化过程中得到了证实。光电离过程中产生的水合电子与基态OFLX反应,速率常数为2.0±0.2×10(10) dm3 mol-1 s-1,如此产生的阴离子在410 nm(消光系数 = 3000±300 dm3 mol-1 cm-1)和530 nm处有两个吸收带。三重态-三重态吸收在610 nm处有最大值,消光系数为11,000±1500 dm3 mol-1 cm-1。三重态形成的量子产率已确定为0.33±0.05。在有氧存在的情况下,三重态反应分别形成激发单重态氧和超氧阴离子,量子产率分别为0.13和≤0.2。此外,超氧阴离子也通过氧与光电离产生的水合电子反应形成。因此,OFLX引起的光敏性可能由氧自由基和/或作为半抗原的OFLX自由基引发。