Gali A, Aradi B, Deak P, Choyke WJ, Son NT
Department of Atomic Physics, Technical University of Budapest, Budafoki ut 8., H-1111, Budapest, Hungary.
Phys Rev Lett. 2000 May 22;84(21):4926-9. doi: 10.1103/PhysRevLett.84.4926.
Epitaxial silicon carbide is likely to contain hydrogen and vacancies ( V); therefore, V+nH complexes are likely to influence its electronic properties. Using ab initio calculations we show that neutral and positive H atoms are trapped by carbon vacancies ( V(C)) in three-center bonds with two Si neighbors. The double positive charge state of V(C)+H is not stable in equilibrium and in the triply positive state H binds only to one of the Si neighbors. At most two H atoms can be accommodated by a single V(C). The V(C)+nH complexes have donor character and exhibit rather atypical vibration modes for Si-H bonds. Occupation levels and spin distributions were calculated and compared for V(C)+H and V(C).
外延碳化硅可能含有氢和空位(V);因此,V + nH络合物可能会影响其电子性能。通过从头算计算,我们表明中性和正氢原子被碳空位(V(C))捕获,形成与两个硅相邻原子的三中心键。V(C)+H的双正电荷态在平衡状态下不稳定,在三正电荷态下,H仅与其中一个硅相邻原子结合。单个V(C)最多可容纳两个H原子。V(C)+nH络合物具有施主特性,并表现出相当非典型的Si-H键振动模式。计算并比较了V(C)+H和V(C)的占据能级和自旋分布。