Igumbor E, Olaniyan O, Mapasha R E, Danga H T, Omotoso E, Meyer W E
Department of Physics, University of Pretoria, Pretoria 0002, South Africa. Department of Mathematical and Physical Sciences, Samuel Adegboyega University, Ogwa, Edo State, Nigeria.
J Phys Condens Matter. 2018 May 10;30(18):185702. doi: 10.1088/1361-648X/aab819. Epub 2018 Mar 20.
Electrically active induced energy levels in semiconductor devices could be beneficial to the discovery of an enhanced p or n-type semiconductor. Nitrogen (N) implanted into 4H-SiC is a high energy process that produced high defect concentrations which could be removed during dopant activation annealing. On the other hand, boron (B) substituted for silicon in SiC causes a reduction in the number of defects. This scenario leads to a decrease in the dielectric properties and induced deep donor and shallow acceptor levels. Complexes formed by the N, such as the nitrogen-vacancy centre, have been reported to play a significant role in the application of quantum bits. In this paper, results of charge states thermodynamic transition level of the N and B vacancy-complexes in 4H-SiC are presented. We explore complexes where substitutional N[Formula: see text]/N[Formula: see text] or B[Formula: see text]/B[Formula: see text] sits near a Si (V[Formula: see text]) or C (V[Formula: see text]) vacancy to form vacancy-complexes (N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text] and B[Formula: see text]V[Formula: see text]). The energies of formation of the N related vacancy-complexes showed the N[Formula: see text]V[Formula: see text] to be energetically stable close to the valence band maximum in its double positive charge state. The N[Formula: see text]V[Formula: see text] is more energetically stable in the double negative charge state close to the conduction band minimum. The N[Formula: see text]V[Formula: see text] on the other hand, induced double donor level and the N[Formula: see text]V[Formula: see text] induced a double acceptor level. For B related complexes, the B[Formula: see text]V[Formula: see text] and B[Formula: see text]V[Formula: see text] were energetically stable in their single positive charge state close to the valence band maximum. As the Fermi energy is varied across the band gap, the neutral and single negative charge states of the B[Formula: see text]V[Formula: see text] become more stable at different energy levels. B and N related complexes exhibited charge state controlled metastability behaviour.
半导体器件中的电活性诱导能级可能有助于发现增强型p型或n型半导体。注入到4H-SiC中的氮(N)是一个高能过程,会产生高缺陷浓度,这些缺陷在掺杂剂激活退火过程中可以被去除。另一方面,在SiC中用硼(B)替代硅会导致缺陷数量减少。这种情况会导致介电性能下降,并诱导出深施主能级和浅受主能级。据报道,由N形成的复合物,如氮-空位中心,在量子比特的应用中起着重要作用。本文给出了4H-SiC中N和B空位复合物的电荷态热力学转变能级的结果。我们探索了替代型N[化学式:见原文]/N[化学式:见原文]或B[化学式:见原文]/B[化学式:见原文]位于Si(V[化学式:见原文])或C(V[化学式:见原文])空位附近形成空位复合物(N[化学式:见原文]V[化学式:见原文]、N[化学式:见原文]V[化学式:见原文]、N[化学式:见原文]V[化学式:见原文]、N[化学式:见原文]V[化学式:见原文]、B[化学式:见原文]V[化学式:见原文]、B[化学式:见原文]V[化学式:见原文]、B[化学式:见原文]V[化学式:见原文]和B[化学式:见原文]V[化学式:见原文])的情况。与N相关的空位复合物的形成能表明,N[化学式:见原文]V[化学式:见原文]在其双正电荷态下靠近价带最大值时在能量上是稳定的。N[化学式:见原文]V[化学式:见原文]在靠近导带最小值的双负电荷态下在能量上更稳定。另一方面,N[化学式:见原文]V[化学式:见原文]诱导出双施主能级,N[化学式:见原文]V[化学式:见原文]诱导出双受主能级。对于与B相关的复合物来说,B[化学式:见原文]V[化学式:见原文]和B[化学式:见原文]V[化学式:见原文]在其单正电荷态下靠近价带最大值时在能量上是稳定的。随着费米能在带隙中变化,B[化学式:见原文]V[化学式:见原文]的中性和单负电荷态在不同能级下变得更稳定。与B和N相关的复合物表现出电荷态控制的亚稳性行为。