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通过程序升温脱附法研究气相法和沉淀法二氧化硅颗粒的H(2)O脱气特性

H(2)O Outgassing Properties of Fumed and Precipitated Silica Particles by Temperature-Programmed Desorption.

作者信息

Dinh LN, Balooch M, LeMay JD

机构信息

Chemistry and Materials Science, Lawrence Livermore National Laboratory, Livermore, California, 94551

出版信息

J Colloid Interface Sci. 2000 Oct 15;230(2):432-440. doi: 10.1006/jcis.2000.7131.

Abstract

Temperature-programmed desorption was performed at temperatures up to 850 K on as-received fumed and precipitated silica particles. Physisorbed water molecules on both types of silica had activation energies in the range of 38-61 kJ/mol. However, the activation energies of desorption for chemisorbed water varied from approximately 80 to >247 kJ/mol for fumed silica, Cab-O-Sil-M-7D, and approximately 96 to 155 kJ/mol for precipitated silica, Hi-Sil-233. Our results suggest that physisorbed water can be effectively pumped away at room temperature (or preferably at 320 K) in a matter of hours. Chemisorbed water with high activation energies of desorption (>126 kJ/mol) will not escape silica surfaces in 100 years even at 320 K, while a significant amount of the chemisorbed water with medium activation energies (80-109 kJ/mol) will leave the silica surfaces in that time span. Most of the chemisorbed water with activation energies <126 kJ/mol can be pumped away in a matter of days in a good vacuum environment at 500 K. We had previously measured about 0.1-0.4 wt% of water in silica-reinforced polysiloxane formulations containing approximately 21% Cab-O-Sil-M-7D and approximately 4% Hi-Sil-233. Comparing present results with these formulations, we conclude that the adsorbed H(2)O and the Si-OH bonds on the silica surfaces are the major contributors to water outgassing from these types of silica-filled polymers. Copyright 2000 Academic Press.

摘要

在高达850 K的温度下,对原样的气相法二氧化硅和沉淀二氧化硅颗粒进行程序升温脱附。两种类型二氧化硅上的物理吸附水分子的活化能在38 - 61 kJ/mol范围内。然而,气相法二氧化硅Cab - O - Sil - M - 7D上化学吸附水的脱附活化能约为80至>247 kJ/mol,沉淀二氧化硅Hi - Sil - 233上化学吸附水的脱附活化能约为96至155 kJ/mol。我们的结果表明,物理吸附水在室温(或优选320 K)下几小时内就能有效地被抽走。脱附活化能高(>126 kJ/mol)的化学吸附水即使在320 K下100年内也不会从二氧化硅表面逸出,而大量脱附活化能中等(80 - 109 kJ/mol)的化学吸附水在该时间段内会离开二氧化硅表面。在500 K的良好真空环境中,大部分脱附活化能<126 kJ/mol的化学吸附水在几天内就能被抽走。我们之前在含有约21% Cab - O - Sil - M - 7D和约4% Hi - Sil - 233的二氧化硅增强聚硅氧烷配方中测得约0.1 - 0.4 wt%的水。将目前的结果与这些配方进行比较,我们得出结论,二氧化硅表面吸附的H₂O和Si - OH键是这类二氧化硅填充聚合物中水汽脱气的主要因素。版权所有2000年学术出版社。

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