Albès B, Marguery M C, Schwarze H P, Journé F, Loche F, Bazex J
Department of Dermatology, Hospital Purpan, Toulouse, France.
Dermatology. 2000;201(2):171-4. doi: 10.1159/000018466.
We report the third case of prolonged photosensitivity secondary to contact photoallergy to topical ketoprofen, a 2-arylpropionic acid derivative. The patient suffered from persistent photosensitivity for more than 1 year after the withdrawal of ketoprofen with recurrent eruptions on sun-exposed skin areas. This photosensitivity was associated with a persistent decrease in polychromatic and UVA minimal erythemal doses. Photobiological testing revealed cross-reactivity with fenofibrate and benzophenones. Photoallergy to ketoprofen is due to the benzophenone structure or to the very similar thiophene phenylketone of tiaprofenic acid, but not to the arylpropionic function. Thus, fenofibrate, tiaprofenic acid and benzophenones should be avoided by patients with a positive history of photocontact dermatitis to ketoprofen.
我们报告了第三例因对局部用酮洛芬(一种2-芳基丙酸衍生物)发生接触性光过敏而导致的长期光敏性病例。该患者在停用酮洛芬后,暴露于阳光下的皮肤区域反复出现皮疹,持续光敏性超过1年。这种光敏性与多色光和UVA最小红斑剂量的持续降低有关。光生物学测试显示与非诺贝特和二苯甲酮存在交叉反应。对酮洛芬的光过敏是由于二苯甲酮结构或与噻洛芬酸非常相似的噻吩苯酮,而非芳基丙酸官能团。因此,有酮洛芬光接触性皮炎阳性病史的患者应避免使用非诺贝特、噻洛芬酸和二苯甲酮。