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Analysis of the metallic phase of two-dimensional holes in SiGe in terms of temperature dependent screening.

作者信息

Senz V, Ihn T, Heinzel T, Ensslin K, Dehlinger G, Grutzmacher D, Gennser U

机构信息

Laboratory of Solid State Physics, ETH Zurich, CH-8093 Zurich, Switzerland.

出版信息

Phys Rev Lett. 2000 Nov 13;85(20):4357-60. doi: 10.1103/PhysRevLett.85.4357.

Abstract

We find that temperature dependent screening can quantitatively explain the metallic behavior of the resistivity on the metallic side of the so-called metal-insulator transition in p-SiGe. Interference and interaction effects exhibit the usual insulating behavior which is expected to overpower the metallic background at sufficiently low temperatures. We find empirically that the concept of a Fermi liquid describes our system with its large interaction parameter r(s) approximately 8.

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