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拟南芥中四个调控叶片发育的新基因的鉴定与遗传定位。

Identification and genetic mapping of four novel genes that regulate leaf development in Arabidopsis.

作者信息

Yue S, Zhang W, Li F L, Guo Y L, Liu T L, Huang H

机构信息

Shanghai Institute of Plant Physiology, Chinese Academy of Science, Shanghai, China.

出版信息

Cell Res. 2000 Dec;10(4):325-35. doi: 10.1038/sj.cr.7290059.

Abstract

Molecular and genetic characterizations of mutants have led to a better understanding of many developmental processes in the model system Arabidopsis thaliana. However, the leaf development that is specific to plants has been little studied. With the aim of contributing to the genetic dissection of leaf development, we have performed a large-scare screening for mutants with abnormal leaves. Among a great number of leaf mutants we have generated by T-DNA and transposon tagging and ethyl-methae sulfonate (EMS) mutagenesis, four independent mutant lines have been identified and studied genetically. Phenotypes of these mutant lines represent the defects of four novel nuclear genes designated LL1 (LOTUS LEAF 1), LL2 (LOTUS LEAF 2), URO (UPRIGHT ROSETTE). and EIL (ENVIRONMENT CONDITION INDUCED LESION). The phenotypic analysis indicates that these genes play important roles during leaf development. For the further genetic analysis of these genes and the map-based cloning of LL1 and LL2, we have mapped these genes to chromosome regions with an efficient and rapid mapping method.

摘要

对突变体进行的分子和遗传特征分析,有助于更好地理解模式植物拟南芥中的许多发育过程。然而,针对植物特有的叶片发育的研究却很少。为了促进对叶片发育的遗传剖析,我们对叶片异常的突变体进行了大规模筛选。在通过T-DNA、转座子标签和甲基磺酸乙酯(EMS)诱变产生的大量叶片突变体中,已鉴定出四个独立的突变体系并对其进行了遗传研究。这些突变体系的表型代表了四个新的核基因的缺陷,这些基因分别命名为LL1(莲花叶1)、LL2(莲花叶2)、URO(直立莲座)和EIL(环境条件诱导损伤)。表型分析表明,这些基因在叶片发育过程中发挥着重要作用。为了对这些基因进行进一步的遗传分析以及对LL1和LL2进行图位克隆,我们采用了一种高效快速的定位方法,将这些基因定位到染色体区域。

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