Jan J C, Asokan K, Chiou J W, Pong W F, Tseng P K, Chen L C, Chen F R, Lee J F, Wu J S, Lin H J, Chen C T
Department of Physics, Tamkang University, Tamsui, Taiwan.
J Synchrotron Radiat. 2001 Mar 1;8(Pt 2):827-9. doi: 10.1107/s0909049501001911.
X-ray absorption spectroscopy was used to investigate the electronic structure of as-deposited and oxidized Ni/Au contacts to p-GaN and to elucidate the mechanism responsible for low impedance. X-ray absorption near edge spectra of Ni K- and L3,2-edges clearly indicate formation of NiO on the sample surface after annealing. The reason for low impedance may be attributed to increase in hole concentration and existence of p-NiO layer on the surface.
采用X射线吸收光谱法研究了沉积态和氧化态的Ni/Au与p-GaN接触的电子结构,并阐明了低阻抗的形成机制。Ni K边和L3,2边的X射线吸收近边光谱清楚地表明,退火后样品表面形成了NiO。低阻抗的原因可能归因于空穴浓度的增加以及表面p-NiO层的存在。