Gareev R R, Bürgler D E, Buchmeier M, Olligs D, Schreiber R, Grünberg P
Institut für Festkörperforschung, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany.
Phys Rev Lett. 2001 Oct 8;87(15):157202. doi: 10.1103/PhysRevLett.87.157202. Epub 2001 Sep 21.
We study interlayer exchange coupling in epitaxial Fe/Fe(0.56)Si(0.44)/Fe trilayers. Iron-silicide spacers with high structural and compositional homogeneity for thicknesses up to 34 A are grown by coevaporation from two electron-beam sources. The coupling strength oscillates with spacer thickness for temperatures from 20 to 300 K with two antiferromagnetic maxima at 12 and 26 A, and it clearly increases with decreasing temperature down to 80 K. We conclude that the coupling across ordered Fe(1-x)Si(x) ( x approximately 0.5) is described by the conventional theory of interlayer coupling across metallic spacers.
我们研究外延Fe/Fe(0.56)Si(0.44)/Fe三层膜中的层间交换耦合。通过从两个电子束源共蒸发生长出厚度达34埃的具有高结构和成分均匀性的硅化铁间隔层。在20至300 K的温度范围内，耦合强度随间隔层厚度振荡，在12埃和26埃处有两个反铁磁最大值，并且在温度降至80 K时明显随温度降低而增加。我们得出结论，跨越有序Fe(1 - x)Si(x)（x约为0.5）的耦合可由跨越金属间隔层的层间耦合传统理论来描述。
