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Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

作者信息

Sun Shuqing, Chong Karen S L, Leggett Graham J

机构信息

Department of Chemistry, Institute of Science and Technology, University of Manchester, P.O. Box 88, Manchester M60 1QD, UK.

出版信息

J Am Chem Soc. 2002 Mar 20;124(11):2414-5. doi: 10.1021/ja017673h.

DOI:10.1021/ja017673h
PMID:11890771
Abstract

Nanometer-scale patterns have been created in self-assembled monolayers by using a scanning near-field optical microscope coupled to an ultra-violet laser emitting light at a wavelength of 244 nm. Sharp, chemically well-defined features with dimensions as small as 40 nm have been created routinely, and on occasions line widths of 25 nm (lambda/10) have been achieved. Because of the wide range of photochemical methods available for surface derivatization, this approach promises to provide a flexible and versatile route to the generation of molecular and biological nanostructures for a wide range of applications.

摘要

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