Lee Cheng-Chung, Tien Chuen-Lin, Hsu Jin-Cherng
Institute of Optical Sciences, National Central University, Chung-li, Taiwan.
Appl Opt. 2002 Apr 1;41(10):2043-7. doi: 10.1364/ao.41.002043.
The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, Vb. The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to Vb, and a high compressive stress of -0.467 GPa was measured at Vb = 850 V. The Nb2O5-SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film.
研究了离子束能量对Nb2O5薄膜内应力和光学性能的影响。通过不同离子束电压Vb的离子束溅射，在未加热的玻璃衬底上沉积Nb2O5薄膜。发现折射率、消光系数和表面粗糙度取决于离子束能量。采用相移干涉测量技术测量薄膜中的应力。还发现薄膜应力与Vb有关，在Vb = 850 V时测得的高压缩应力为-0.467 GPa。与单层Nb2O5薄膜相比，Nb2O5-SiO2多层涂层的平均压缩应力较小。
