Bischoff Martin, Nowitzki Tobias, Voß Oliver, Wilbrandt Steffen, Stenzel Olaf
Appl Opt. 2014 Feb 1;53(4):A212-20. doi: 10.1364/AO.53.00A212.
Ion-beam-sputtering (IBS) single-layer and multilayer coating designs for UV applications were examined after the deposition process as well as after a defined postdeposition treatment. High internal compressive film stress as well as moderate absorption losses in the UV spectral range were measured at the as-deposited thin films. Due to a controlled postdeposition treatment process, the absorption losses and the high compressive stress can be reduced significantly. We show that the remaining thin-film stress of SiO2 and HfO2 multilayer designs can be specifically manipulated by the parameters of the postdeposition treatment. Even zero and tensile stress can be achieved for complex multilayer coatings.
在沉积过程之后以及经过特定的沉积后处理之后，对用于紫外线应用的离子束溅射（IBS）单层和多层涂层设计进行了研究。在沉积态的薄膜中测量到了较高的内部压缩膜应力以及紫外线光谱范围内适度的吸收损耗。由于采用了可控的沉积后处理工艺，吸收损耗和高压缩应力可显著降低。我们表明，SiO₂ 和 HfO₂ 多层设计的剩余薄膜应力可通过沉积后处理的参数进行特定调控。对于复杂的多层涂层，甚至可以实现零应力和拉伸应力。
