Forna N, Burlui V, Aelenei N, Nemţoi G, Indrei A, Aelenei D, Mârţu S
Clinica de Protetică Dentară, Facultatea de Medicină Stomatologică, Universitatea de Medicină şi Farmacie Gr.T. Popa Iaşi.
Rev Med Chir Soc Med Nat Iasi. 2001 Jan-Mar;105(1):151-6.
The potentiodynamic polarization methods have been employed to evaluate the corrosion resistance of the Gaudent-S dental alloy in a slightly acid artificial saliva (Fusayama's saliva; pH = 6.18), a slightly alkaline artificial saliva (Rondelli's saliva; pH = 7.75) and in an acid saline solution (NaCl/lactic acid; pH = 2.64). The results were compared with those obtained for copper and aluminium--the principal components of the studied alloy. In Fusayama's artificial saliva both the copper and Gaudent alloy exhibit close indentic cyclic voltammograms, typical for pitting corrosion; the pitting potentials being 1550 mV (SCE) for Gaudent-S and 1350 mV (SCE) for copper, while the repassivation potential is 700 mV (SCE), the same for the two analysed metals. In the Rondelli's artificial saliva and in acidic saline solution the passivation domain is considerable reduced; the corrosion potential and the repassivation potential coincides. In the saline acid solution the current densities are two times higher than those obtained in the other two solutions. In the aluminium case it can be noticed that the passivation domain is very reduced, no cathodic peak is observed and much more current densities are registered in the positive potential domain.
采用动电位极化法评估了高登特 - S牙科合金在微酸性人工唾液（船桥氏唾液；pH = 6.18）、微碱性人工唾液（龙代利氏唾液；pH = 7.75）以及酸性盐溶液（NaCl/乳酸；pH = 2.64）中的耐腐蚀性。将结果与所研究合金的主要成分铜和铝的结果进行了比较。在船桥氏人工唾液中，铜和高登特合金均呈现出相似的典型点蚀循环伏安图；高登特 - S的点蚀电位为1550 mV（饱和甘汞电极），铜的点蚀电位为1350 mV（饱和甘汞电极），而两种被分析金属的再钝化电位均为700 mV（饱和甘汞电极）。在龙代利氏人工唾液和酸性盐溶液中，钝化区域显著减小；腐蚀电位和再钝化电位重合。在酸性盐溶液中，电流密度比在其他两种溶液中获得的电流密度高出两倍。在铝的情况下，可以注意到钝化区域非常小，未观察到阴极峰，并且在正电位区域记录到的电流密度要大得多。
