Richter Mathias, Kroth Udo, Gottwald Alexander, Gerth Christopher, Tiedtke Kai, Saito Terubumi, Tassy Ivan, Vogler Klaus
Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12,10587 Berlin, Germany.
Appl Opt. 2002 Dec 1;41(34):7167-72. doi: 10.1364/ao.41.007167.
In the framework of current development in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.
在157纳米光刻技术当前发展的框架下，我们研究了光电探测器的性能，重点关注其稳定性和线性度。测量是在柏林电子储存环BESSY I和BESSY II的德国物理技术研究院的辐射测量实验室进行的，使用光谱分散的同步辐射以及157纳米的高脉冲F2激光辐射，并结合低温辐射计作为主要探测器标准。在紫外和真空紫外辐射光谱范围内对光电探测器进行校准时，相对标准不确定度低至1%。
