在蒸发的As2Se3薄膜中，由633纳米光照光致产生的强布拉格光栅。

Strong Bragg gratings photoinduced by 633-nm illumination in evaporated As2Se3 thin films.

作者信息

Robinson Travis G, DeCorby Ray G, McMullin James N, Haugen Chris J, Kasap Safa O, Tonchev Dancho

机构信息

Department of Electrical Engineering, University of Alberta, Edmonton, Alberta T6G2V4, Canada.

出版信息

Opt Lett. 2003 Mar 15;28(6):459-61. doi: 10.1364/ol.28.000459.

DOI:10.1364/ol.28.000459

PMID:12659279

Abstract

Bragg gratings are used in several photonic devices to reflect, and thus to isolate, specific wavelengths of light. Gratings can be photoinduced in chalcogenide glasses by illumination of bandgap light in an interference pattern. We used holographic interferometry to create Bragg gratings in amorphous As2Se3 thin films with a period of 0.56 microm by illumination with 633-nm light. The quality of the gratings was tested in real time, and refractive-index modulations as high as 0.037 were measured. These gratings were found to be stable over a period of several months if they were kept in the dark.

摘要

布拉格光栅用于多种光子器件中，以反射特定波长的光，从而实现光的隔离。通过以干涉图样照射带隙光，可在硫族化物玻璃中光致产生光栅。我们利用全息干涉术，通过用633纳米的光照射，在非晶态As2Se3薄膜中制作出周期为0.56微米的布拉格光栅。实时测试了光栅的质量，并测量到高达0.037的折射率调制。如果将这些光栅保存在黑暗中，发现它们在几个月的时间内都是稳定的。