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通过磁阻测量探测窄铁磁环结构中的畴壁钉扎

Domain wall pinning in narrow ferromagnetic ring structures probed by magnetoresistance measurements.

作者信息

Kläui M, Vaz C A F, Rothman J, Bland J A C, Wernsdorfer W, Faini G, Cambril E

机构信息

Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge CB3 OHE, United Kingdom.

出版信息

Phys Rev Lett. 2003 Mar 7;90(9):097202. doi: 10.1103/PhysRevLett.90.097202. Epub 2003 Mar 3.

Abstract

We present a magnetoresistance study of magnetization reversal and domain wall pinning effects in a mesoscopic narrow ferromagnetic Permalloy ring structure containing notches. The size and strength of the attractive pinning potential created by a notch is measured and the resistance minimum at remanence is found to occur when a single transverse domain wall is pinned at the notch, in agreement with the results of numerical simulations of the anisotropic magnetoresistance. When a field is applied in the direction corresponding to a potential well edge, a novel magnetic state with a very wide domain wall is stabilized, giving rise to a characteristic signature in the magnetoresistance at such angles.

摘要

我们展示了对含缺口的介观窄铁磁坡莫合金环形结构中磁化反转和畴壁钉扎效应的磁电阻研究。测量了由缺口产生的吸引钉扎势的大小和强度,并且发现当单个横向畴壁被钉扎在缺口处时,剩余磁化强度下的电阻最小值出现,这与各向异性磁电阻的数值模拟结果一致。当沿对应于势阱边缘的方向施加磁场时,一种具有非常宽畴壁的新型磁态得以稳定,在该角度下的磁电阻中产生特征信号。

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