使用混合衍射光掩模对光刻透镜进行像差测量。

Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks.

作者信息

Sung Jinwon, Pitchumani Mahesh, Johnson Eric G

机构信息

School of Optics, CREOL, University of Central Florida, P.O. Box 162700, 4000 Central Florida Boulevard, Orlando, Florida 32816-2700, USA.

出版信息

Appl Opt. 2003 Apr 10;42(11):1987-95. doi: 10.1364/ao.42.001987.

DOI:10.1364/ao.42.001987

PMID:12699345

Abstract

In optical lithography the degradation of image quality due to aberrations present in the exposure tool is a serious problem. Therefore it is desirable to establish a reliable aberration measurement procedure based on the analysis of printed images in the photoresist. We present what is to our knowledge a new method for characterizing the aberrations of an exposure tool using a hybrid diffractive photomask. By utilizing each different impact on the aberrated image from each diffracted illumination, we were able to extract the aberration present in the stepper system. We experimentally verified this method with a G-line stepper and verified its spherical aberration astigmatism.

摘要

在光学光刻中，由于曝光工具中存在像差而导致图像质量下降是一个严重问题。因此，期望基于光刻胶中印刷图像的分析建立一种可靠的像差测量程序。我们提出了一种据我们所知使用混合衍射光掩模来表征曝光工具像差的新方法。通过利用每种衍射照明对像差图像的不同影响，我们能够提取步进光刻机系统中存在的像差。我们用一台G线步进光刻机对该方法进行了实验验证，并验证了其球差和像散。