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用于检测硅不同Si-O键合状态的X射线光电子能谱。

X-ray photoelectron spectroscopy for detection of the different Si-O bonding states of silicon.

作者信息

Pleul Dieter, Frenzel Ralf, Eschner Michael, Simon Frank

机构信息

Institute of Polymer Research, Hohe Strasse 6, 01069, Dresden, Germany.

出版信息

Anal Bioanal Chem. 2003 Apr;375(8):1276-81. doi: 10.1007/s00216-003-1811-7. Epub 2003 Mar 28.

DOI:10.1007/s00216-003-1811-7
PMID:12733050
Abstract

X-ray photoelectron spectroscopy (XPS) was used to detect the bonding between a silica particle surface and attached silanes. In addition to the commonly recorded Si 2p spectrum, the Si 1 s level is also accessible when monochromatic Ag Lalpha X-rays are applied. Furthermore, the spectrum of the Si 1 s level shows a fine structure. After spectrum deconvolution, we assigned the fitted spectral peaks to Si-C bonds of the silanes and to the Si-O bonds of the silica network. The recorded Si 1 s spectra were deconvoluted into peaks originating from Si-C bonds and the Si-O-Si silica network. To check the results of spectrum deconvolution, several differently functionalized silanes containing stoichiometric amounts of heteroatoms were applied for silica surface modification. We conclude that spectra deconvolution of the Si 1 s signal is an appropriate means for quantification of surface attached silane molecules.

摘要

X射线光电子能谱(XPS)用于检测二氧化硅颗粒表面与附着硅烷之间的键合。除了通常记录的Si 2p光谱外,当使用单色Ag Lα X射线时,Si 1s能级也可被检测到。此外,Si 1s能级的光谱显示出精细结构。经过光谱去卷积后,我们将拟合的光谱峰归属于硅烷的Si-C键和二氧化硅网络的Si-O键。记录的Si 1s光谱被去卷积为源自Si-C键和Si-O-Si二氧化硅网络的峰。为了检验光谱去卷积的结果,几种含有化学计量杂原子的不同功能化硅烷被用于二氧化硅表面改性。我们得出结论,Si 1s信号的光谱去卷积是定量表面附着硅烷分子的合适方法。

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