Oyabu Noriaki, Custance Oscar, Yi Insook, Sugawara Yasuhiro, Morita Seizo
Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, 565-0871, Japan.
Phys Rev Lett. 2003 May 2;90(17):176102. doi: 10.1103/PhysRevLett.90.176102.
A near contact atomic force microscope operated at low-temperature is used for vertical manipulation of selected single atoms from the Si(111)-(7 x 7) surface. The strong repulsive short-range chemical force interaction between the closest atoms of both tip apex and surface during a soft nanoindentation leads to the removal of a selected silicon atom from its equilibrium position at the surface without additional perturbation of the (7 x 7) unit cell. Deposition of a single atom on a created vacancy at the surface is achieved as well. These manipulation processes are purely mechanical, since neither bias voltage nor voltage pulse is applied between probe and sample. Differences in the mechanical response of the two nonequivalent adatoms of the Si(111)-(7 x 7) with the load applied is also detected.
一台在低温下操作的近接触原子力显微镜用于从Si(111)-(7×7)表面垂直操纵选定的单个原子。在软纳米压痕过程中,探针尖端和表面最接近的原子之间强烈的排斥性短程化学力相互作用导致选定的硅原子从其在表面的平衡位置被移除,而(7×7)晶胞没有受到额外的扰动。也实现了在表面产生的空位上沉积单个原子。这些操纵过程是纯机械的,因为在探针和样品之间既不施加偏置电压也不施加电压脉冲。还检测到了Si(111)-(7×7)的两个不等价吸附原子在施加负载时机械响应的差异。