Vida Gy, Josepovits V K, Gyor M, Deák P
Budapest University of Technology and Economics, Department of Atomic Physics, Surface Physics Laboratory, Budafoki ut 8, Budapest, H-1111, Hungary.
Microsc Microanal. 2003 Aug;9(4):337-42. doi: 10.1017/S143192760303023X.
The changes of the work function (Phi) and the secondary electron emission (SEE) of oxygen covered polycrystalline tungsten occurring after ion sputtering and heat treatments have been investigated. The chemical composition was analyzed by X-ray photoelectron spectroscopy (XPS), and the electron emission properties by work function spectroscopy (WFS). We observed in what manner the chemical changes of the surface are reflected in the work function and SEE. The simultaneous change of Phi and SEE in the case of oxygen covered tungsten have been pointed out and a direct relationship between them can be supposed.
研究了离子溅射和热处理后，氧覆盖的多晶钨的功函数（Phi）和二次电子发射（SEE）的变化。通过X射线光电子能谱（XPS）分析化学成分，通过功函数能谱（WFS）分析电子发射特性。我们观察到表面的化学变化以何种方式反映在功函数和SEE中。指出了氧覆盖钨情况下Phi和SEE的同时变化，并推测它们之间存在直接关系。
